Imprinting well-controlled nanopores in organosilicate dielectric films: Triethoxysilyl-modified six-armed poly(ε-caprolactone) and its chemical hybridization with an organosilicate precursor

Advanced Materials

Volumn 17, Issue 6, 2005, Pages 696-701

  Lee, Byeongdu ^a   Oh, Weontae ^a   Hwang, Yongtaek ^a   Park, Young Hee ^a   Yoon, Jinhwan ^a   Jin, Kyeong Sik ^a   Heo, Kyuyoung ^a   Kim, Jehan ^a   Kim, Kwang Woo ^a   Ree, Moonhor ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; CARRIER CONCENTRATION; CHEMICAL MODIFICATION; CURING; NANOSTRUCTURED MATERIALS; PORE SIZE; POROSITY; POROUS MATERIALS; PYROLYSIS; SILICON COMPOUNDS; SILICON WAFERS; SPIN COATING; THERMOGRAVIMETRIC ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY SCATTERING;

CHEMICAL HYBRIDIZATION; GRAZING-INCIDENCE SMALL-ANGLE X-RAY SCATTERING (GISXS); POROGENS; POROUS FILMS;

DIELECTRIC FILMS;

EID: 20144375342     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200400919     Document Type: Article

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