Forouhi-Bloomer and Tauc-Lorentz optical dispersions applied using spectroscopic ellipsometry to plasma-deposited fluorocarbon films

Journal of Applied Physics

Volumn 101, Issue 7, 2007, Pages

  Easwarakhanthan, T ^a   Beyssen, D ^a   Le Brizoual, L ^a   Alnot, P ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FLUOROCARBONS; INTERFACES (MATERIALS); OPTICAL CONSTANTS; PERMITTIVITY; SILICON COMPOUNDS; SPECTROSCOPIC ELLIPSOMETRY;

FILM OPTICAL CONSTANTS; MULTIPLE SAMPLE ANALYSIS (MSA); OPTICAL DISPERSIONS; PLASMA DEPOSITED FLUOROCARBON FILMS;

THIN FILMS;

EID: 34247257894     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.271971     Document Type: Article

References (36)

1. J. A. Theil, J. Vac. Sci. Technol. B 17, 2397 (1999).
2. D. Koshel, H. Ji, B. Terreault, A. Côté, G. G. Ross, G. Abel, and M. Bolduc, Surf. Coat. Technol. 173, 161 (2003).
3. H. Yokomichi and A. Masuda, J. Appl. Phys. 86, 2468 (1999).
4. C. Ye, Z. Ning, S. Cheng, Y. Xin, and S. Xu, Diamond Relat. Mater. 13, 191 (2004).
5. J. W. Yi, Y. H. Lee, and B. Farouk, Thin Solid Films 374, 103 (2000).
6. X. Wang, H. R. Harris, K. Bouldin, K. Temkin, S. Gangopadhyay, M. D. Strathman, and M. West, J. Appl. Phys. 87, 621 (2000).
7. Y. Jin, P. K. Ajmera, G. S. Lee, and V. Singh, J. Electron. Mater. 34, 1193 (2005).
8. T. E. F. M. Standaert, M. Schaepkens, N. R. Rueger, P. G. M. Sebel, G. S. Oehrlein, and J. M. Cook, J. Vac. Sci. Technol. A 16, 239 (1998).
9. S. H. Cho, Z.-T. Park, J.-G. Kim, and J.-H. Boo, Surf. Coat. Technol. 174-175, 1111 (2003).
10. J. J. Senkevich, M. J. Tutor, and D. W. Sherrer II, Chem. Vap. Deposition 6, 13 (2000).
11. K. K. S. Lau, J. A. Caulfield, and K. K. Gleason, J. Vac. Sci. Technol. A 18, 2404 (2000).
12. L. Sandrin, M. S. Silverstein, and E. Sacher, Polymer 42, 3761 (2001).
13. C. B. Labelle, R. Opila, and A. Kornblit, J. Vac. Sci. Technol. A 23, 190 (2005).
14. T. Easwarakhanthan, D. Beyssan, L. Le Brizoual, and J. Bougdira, J. Vac. Sci. Technol. A 24, 1036 (2006).
15. A. R. Forouhi and I. Bloomer, Phys. Rev. B 34, 7018 (1986).
16. G. E. Jellison, Jr. and A. F. Mondine, Appl. Phys. Lett. 69, 371 (1996).
17. J. Hong, S. Lee, C. Cardinaud, and G. Turban, J. Non-Cryst. Solids 265, 125 (2000).
18. T. Katsuno, C. Godet, J. C. Orlianges, A. S. Loir, F. Garrelie, and A. Catherinot, Appl. Phys. A: Mater. Sci. Process. 81, 471 (2005).
19. D. Daineka, V. Suendo, and P. Roca i Cabarrocas, Thin Solid Films 468, 298 (2004).
20. J. Price, P. Y. Hung, T. Rhoad, B. Foran, and A. C. Diebold, Appl. Phys. Lett. 85, 1701 (2004).
21. G. E. Jellison, Thin Solid Films 313-314, 33 (1998).
22. W. A. McGahan, B. Johs, and J. A. Woollam, Thin Solid Films 234, 443 (1993).
23. C. M. Herzinger, B. Johs, W. A. McGahan, J. A. Woolam, and W. Paulson, J. Appl. Phys. 83, 3323 (1998).
24. H. G. Tompkins and W. A. McGahan, Spectroscopic. Ellipsometry and Reflectometry: A Users Guide (Wiley, New York, 1999).
25. H. Biederman and D. Slavinska, Surf. Coat. Technol. 125, 371 (2000).
26. E. J. Winder and K. K. Gleason, J. Appl. Polym. Sci. 78, 842 (2000).
27. K. P. Huang, P. Lin, and H. C. Shih, J. Appl. Phys. 96, 354 (2004).
28. J. W. Coburn, J. Appl. Phys. 50, 5210 (1979).
29. T. Gu, R. A. Ditizio, S. J. Fonash, O. O. Awadelkarim, J. Ruzyllo, R. W. Collins, and H. J. Leary, J. Vac. Sci. Technol. B 12, 567 (1994).
30. S. A. Visser, C. E. Hewitt, J. Fornalik, G. Braunstein, C. Srividya, and S. V. Babu, Surf. Coat. Technol. 96, 210 (1997).
31. D. C. Marra and E. S. Aydil, J. Vac. Sci. Technol. A 15, 2508 (1997).
32. H. Chen and W. Z. Shen, Surf. Coat. Technol. 198, 98 (2005).
33. J. Robertson and E. P. O'Reilly, Phys. Rev. B 35, 2946 (1987).
34. K. Endo, K. Shinoda, and T. Tatsumi, J. Appl. Phys. 86, 2739 (1999).
35. V. Yanev, S. Krischok, A. Opitz, H. Wurmus, J. A. Schefer, N. Schwesinger, and S.-I.-U. Ahmed, Surf. Sci. 566-568, 1229 (2004).
36. S. Agraharam, D. W. Hess, P. A. Kohl, and S. A. B. Allen, J. Vac. Sci. Technol. A 17, 3265 (1999).