Low dielectric fluorinated amorphous carbon thin films grown from C6F6 and Ar plasma

Thin Solid Films

Volumn 374, Issue 1, 2000, Pages 103-108

  Yi, Jeong W ^a   Lee, Young H ^a   Farouk, Bakhtier ^a  

^a Drexel University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; DEPOSITION; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHITIZATION; PERMITTIVITY; RESIDUAL STRESSES; SPECTROPHOTOMETRY; SUBSTRATES; SYNTHESIS (CHEMICAL); THIN FILMS;

FLUORINATED AMORPHOUS CARBON;

AMORPHOUS FILMS;

EID: 0034291493     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01021-X     Document Type: Article

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