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Volumn 198, Issue 1-3 SPEC. ISS., 2005, Pages 98-103

Optical characterization of boron-doped nanocrystalline Si:H thin films

Author keywords

Chemical vapor deposition; Nanostructure; Photon absorption spectroscopy; Raman scattering spectroscopy; Reliability models; Silicon

Indexed keywords

BORON; DOPING (ADDITIVES); LIGHT TRANSMISSION; MATHEMATICAL MODELS; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; X RAY DIFFRACTION ANALYSIS;

FOROUHI-BLOOMER (FB) MODEL; HYDROGENATED NANOCRYSTALLINE SILICON (NC-SI:H); OPTICAL CHARACTERIZATION; TAUC-LORENTZ (TL) MODEL;

THIN FILMS;

NANOCRYSTAL;

EID: 20744447349 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.10.051 Document Type: Article

Times cited : (18)

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