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Volumn 47, Issue 4-5 SPEC. ISS., 2007, Pages 489-496

Initial and PBTI-induced traps and charges in Hf-based oxides/TiN stacks

Author keywords

[No Author keywords available]

Indexed keywords

DRAIN CURRENT; ELECTRON TRAPS; HYSTERESIS; TITANIUM COMPOUNDS; VOLTAGE CONTROL;

EID: 34247149822     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2007.01.068     Document Type: Article
Times cited : (21)

References (29)
  • 1
    • 0033307321 scopus 로고    scopus 로고
    • Ultrathin hafnium oxide with low leakage and excellent reliability for alternative gate dielectric application
    • Lee B.H., Kang L., Qi W.J., Nieh R., Jeon Y., Onishi K., et al. Ultrathin hafnium oxide with low leakage and excellent reliability for alternative gate dielectric application. IEDM Tech Dig (1999) 133-136
    • (1999) IEDM Tech Dig , pp. 133-136
    • Lee, B.H.1    Kang, L.2    Qi, W.J.3    Nieh, R.4    Jeon, Y.5    Onishi, K.6
  • 2
    • 0035872897 scopus 로고    scopus 로고
    • High-k gate dielectrics: current status and materials properties considerations
    • Wilk G.D., Wallace R.M., and Anthony J.M. High-k gate dielectrics: current status and materials properties considerations. J Appl Phys 89 May (2001) 5243
    • (2001) J Appl Phys , vol.89 , Issue.May , pp. 5243
    • Wilk, G.D.1    Wallace, R.M.2    Anthony, J.M.3
  • 3
    • 0036932011 scopus 로고    scopus 로고
    • 75 nm Damascene metal gate and high-k integration for advanced CMOS devices
    • Guillaumot B., Garros X., Lime F., Oshima K., Tavel B., et al. 75 nm Damascene metal gate and high-k integration for advanced CMOS devices. IEDM Tech Dig (2002) 355
    • (2002) IEDM Tech Dig , pp. 355
    • Guillaumot, B.1    Garros, X.2    Lime, F.3    Oshima, K.4    Tavel, B.5
  • 6
    • 4544251907 scopus 로고    scopus 로고
    • Effect of Pre-existing defects on reliability Assessment of high-k gate dielectrics
    • Bersuker G., et al. Effect of Pre-existing defects on reliability Assessment of high-k gate dielectrics. Microelectron Reliab 44 (2004) 1509-1512
    • (2004) Microelectron Reliab , Issue.44 , pp. 1509-1512
    • Bersuker, G.1
  • 7
    • 84955276085 scopus 로고    scopus 로고
    • 2 gate stack", Reliability Phys Symp Proc 2003. p. 41-45.
  • 9
    • 34247154173 scopus 로고    scopus 로고
    • 2 gate stacks", Proc INFOS, Insulating Films on Semicond Conf, Barcelona, 2003; GS15.
  • 11
    • 0031378732 scopus 로고    scopus 로고
    • 2 interface traps in Mos transistors using the charge pumping technique
    • 2 interface traps in Mos transistors using the charge pumping technique. IEEE Trans Electron Dev (1997) 2262
    • (1997) IEEE Trans Electron Dev , pp. 2262
    • Bauza, D.1    Maneglia, Y.2
  • 13
    • 0026204013 scopus 로고
    • Spectroscopic charge pumping: a new procedure for measuring interface trap distributions on MOS transistors
    • Van den Bosch G., Groeseneken G., and Maes H.E. Spectroscopic charge pumping: a new procedure for measuring interface trap distributions on MOS transistors. IEEE Trans Electron Dev (1991) 1820
    • (1991) IEEE Trans Electron Dev , pp. 1820
    • Van den Bosch, G.1    Groeseneken, G.2    Maes, H.E.3
  • 14
    • 34247166443 scopus 로고
    • North-Holland collection, Elsevier Science Publishers quoted pages: p 23 and p 24
    • Barbottin G., and Vapaille A. Instabilities in Silicon devices. Silicon passivation and related instabilities volume 2 (1989), North-Holland collection, Elsevier Science Publishers quoted pages: p 23 and p 24
    • (1989) Silicon passivation and related instabilities , vol.2
    • Barbottin, G.1    Vapaille, A.2
  • 16
    • 0001422334 scopus 로고
    • Coulombic and neutral trapping centers in silicon dioxide
    • Buchanan D.A., Fischetti M.V., and DiMaria D.J. Coulombic and neutral trapping centers in silicon dioxide. Phys Rev B 43 (1991) 1471-1486
    • (1991) Phys Rev B , vol.43 , pp. 1471-1486
    • Buchanan, D.A.1    Fischetti, M.V.2    DiMaria, D.J.3
  • 21
    • 34250785121 scopus 로고    scopus 로고
    • 2 Nmos transistors". IRPS proc, 2006. p. 79-183.
  • 22
    • 34250751294 scopus 로고    scopus 로고
    • 2/metal gate stacks". IRPS proc, 2006. p. 174-8.
  • 23
    • 34247120797 scopus 로고    scopus 로고
    • (1-x)ON/TaN based pMOSFETs", ESSDERC Conf published in Microelectron Eng 2005;80:135-7.
  • 24
    • 33748125814 scopus 로고    scopus 로고
    • Young CD, Nadkarni S, Heh D, Harris HR, Choi R, Peterson JJ, et al. "Detection of electron trap generation due to constant voltage stress on high-k gate stacks", IRPS proceedings, 2006. p. 169-73.
  • 25
    • 20444483731 scopus 로고    scopus 로고
    • Validity of constant voltage stress based reliability assessment of high-k devices
    • Lee B.H., et al. Validity of constant voltage stress based reliability assessment of high-k devices. IEEE Trans Dev Mater Reliab 5 n°1 (2005)
    • (2005) IEEE Trans Dev Mater Reliab , vol.5 , Issue.1
    • Lee, B.H.1
  • 26
    • 26444468109 scopus 로고    scopus 로고
    • 2 gate stack with low preexisting traps
    • September
    • 2 gate stack with low preexisting traps. IEEE Electron Dev Lett 26 no. 9 (2005) September
    • (2005) IEEE Electron Dev Lett , vol.26 , Issue.9
    • Sa, N.1
  • 28
    • 33744905856 scopus 로고
    • Mechanism for stress-induced leakage currents in thin silicon dioxide films
    • DiMaria D.J., and Cartier E. Mechanism for stress-induced leakage currents in thin silicon dioxide films. J Appl Phys 78 (1995) 3883-3894
    • (1995) J Appl Phys , vol.78 , pp. 3883-3894
    • DiMaria, D.J.1    Cartier, E.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.