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1
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33746489728
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Mobility Enhancement of High-κ Gate Stacks Through Reduced Transient Charging
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presented at, Grenoble, France, pp
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P. D. Kirsch, J. H. Sim, S. C. Song, S. Krishnan, J. J. Peterson, H.-J. Li, M. Quevedo-Lopez, C. D. Young, R. Choi, N. Moumen, P. Majhi, Q. Wang, J. G. Ekerdt, G. Bersuker, and B. H. Lee, "Mobility Enhancement of High-κ Gate Stacks Through Reduced Transient Charging," presented at 35th Annual European Solid-State Device Research Conference, Grenoble, France, pp. 367-370, 2005.
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(2005)
35th Annual European Solid-State Device Research Conference
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Kirsch, P.D.1
Sim, J.H.2
Song, S.C.3
Krishnan, S.4
Peterson, J.J.5
Li, H.-J.6
Quevedo-Lopez, M.7
Young, C.D.8
Choi, R.9
Moumen, N.10
Majhi, P.11
Wang, Q.12
Ekerdt, J.G.13
Bersuker, G.14
Lee, B.H.15
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2
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33748104001
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High Mobility Dual Metal Gate MOS Transistors with High-k Gate Dielectrics
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presented at
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K. Takahashi, K. Manabe, A. Morioka, T. Ikarashi, T. Yoshihara, H. Watanabe, and T. Tatsumi, "High Mobility Dual Metal Gate MOS Transistors with High-k Gate Dielectrics," presented at Intl. Conf. on Solid State Devices and Materials, pp. 22-23, 2004.
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Intl. Conf. on Solid State Devices and Materials
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Takahashi, K.1
Manabe, K.2
Morioka, A.3
Ikarashi, T.4
Yoshihara, T.5
Watanabe, H.6
Tatsumi, T.7
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3
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0346765511
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Dielectrics for Future Transistors
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G. Bersuker, P. Zeitzoff, G. A. Brown, and H. R. Huff, "Dielectrics for Future Transistors," Materials Today, pp. 26-33, 2004.
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(2004)
Materials Today
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Bersuker, G.1
Zeitzoff, P.2
Brown, G.A.3
Huff, H.R.4
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4
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20444483731
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Validity of constant voltage stress based reliability assessment of high-κ devices
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B. H. Lee, R. Choi, J. H. Sim, S. A. Krishnan, J. J. Peterson, G. A. Brown, and G. Bersuker, "Validity of constant voltage stress based reliability assessment of high-κ devices," IEEE Transactions on Device and Materials Reliability, vol. 5, pp. 20-25, 2005.
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(2005)
IEEE Transactions on Device and Materials Reliability
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Lee, B.H.1
Choi, R.2
Sim, J.H.3
Krishnan, S.A.4
Peterson, J.J.5
Brown, G.A.6
Bersuker, G.7
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5
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20444441991
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Review on high-κ dielectrics reliability issues
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G. Ribes, J. Mitard, M. Denais, S. Bruyere, F. Monsieur, C. Parthasarathy, E. Vincent, and G. Ghibaudo, "Review on high-κ dielectrics reliability issues," IEEE Transactions on Device and Materials Reliability, vol. 5, pp. 5-19, 2005.
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IEEE Transactions on Device and Materials Reliability
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Ribes, G.1
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Denais, M.3
Bruyere, S.4
Monsieur, F.5
Parthasarathy, C.6
Vincent, E.7
Ghibaudo, G.8
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6
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19944430988
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Interfacial layer-induced mobility degradation in high-k transistors
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G. Bersuker, J. Barnett, N. Moumen, B. Foran, C. D. Young, P. Lysaght, J. Peterson, B. H. Lee, P. M. Zeitzoff, and H. R. Huff, "Interfacial layer-induced mobility degradation in high-k transistors," Jap. J. of Applied Physics Part 1-Regular Papers Short Notes & Review Papers, vol. 43, pp. 7899-7902, 2004.
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Jap. J. of Applied Physics Part 1-Regular Papers Short Notes & Review Papers
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Bersuker, G.1
Barnett, J.2
Moumen, N.3
Foran, B.4
Young, C.D.5
Lysaght, P.6
Peterson, J.7
Lee, B.H.8
Zeitzoff, P.M.9
Huff, H.R.10
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7
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33751121032
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Correlation between Stress-Induced Leakage Current (SILC) and the HfO2 bulk trap density in a SiO2/HfO2 stack
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presented at
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F. Crupi, R. Degraeve, A. Kerber, D. H. Kwak, and G. Groeseneken, "Correlation between Stress-Induced Leakage Current (SILC) and the HfO2 bulk trap density in a SiO2/HfO2 stack," presented at 42nd Annual IEEE Intl. Reliability Physics Symp. Proc., pp. 181-187, 2004.
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(2004)
42nd Annual IEEE Intl. Reliability Physics Symp. Proc
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Crupi, F.1
Degraeve, R.2
Kerber, A.3
Kwak, D.H.4
Groeseneken, G.5
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8
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20044381666
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2 gate stacks with time dependent measurements
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2 gate stacks with time dependent measurements," Microelectronics Reliability, vol. 45, pp. 806-810, 2005.
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(2005)
Microelectronics Reliability
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, pp. 806-810
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Young, C.D.1
Bersuker, G.2
Zhao, Y.G.3
Peterson, J.J.4
Barnett, J.5
Brown, G.A.6
Sim, J.H.7
Choi, R.8
Lee, B.H.9
Zeitzoff, P.10
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9
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28744434610
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Dominant SILC mechanisms in HfO2/TiN gate nMOS and pMOS transistors
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presented at
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S. A. Krishnan, J. J. Peterson, C. D. Young, G. Brown, R. Choi, R. Harris, J. H. Sim, P. Zeitzoff, P. Kirsch, J. Gutt, H. J. Li, K. Matthews, J. C. Lee, B. H. Lee, and G. Bersuker, "Dominant SILC mechanisms in HfO2/TiN gate nMOS and pMOS transistors," presented at 43rd Annual IEEE Intl. Reliability Physics Symp. Proc, pp. 642-643, 2005.
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(2005)
43rd Annual IEEE Intl. Reliability Physics Symp. Proc
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Krishnan, S.A.1
Peterson, J.J.2
Young, C.D.3
Brown, G.4
Choi, R.5
Harris, R.6
Sim, J.H.7
Zeitzoff, P.8
Kirsch, P.9
Gutt, J.10
Li, H.J.11
Matthews, K.12
Lee, J.C.13
Lee, B.H.14
Bersuker, G.15
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10
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0842288138
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2 reliability and yield, presented at IEEE Intl. Electron Devices Meeting
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2 reliability and yield," presented at IEEE Intl. Electron Devices Meeting Tech. Digest, pp. 935-938, 2003.
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(2003)
Tech. Digest
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Degraeve, R.1
Kerber, A.2
Roussell, P.3
Cartier, E.4
Kauerauf, T.5
Pantisano, L.6
Groeseneken, G.7
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11
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21244436373
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Trapping/de-trapping gate bias dependence of Hf-silicate dielectrics with poly and TiN gate electrode
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J. H. Sim, R. Choi, Y. H. Lee, C. Young, P. Zeitzoff, D. L. Kwong, and G. Bersuker, "Trapping/de-trapping gate bias dependence of Hf-silicate dielectrics with poly and TiN gate electrode," Jap. J. of Applied Physics Part 1-Regular Papers Short Notes & Review Papers, vol. 44, pp. 2420-2423, 2005.
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Jap. J. of Applied Physics Part 1-Regular Papers Short Notes & Review Papers
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Sim, J.H.1
Choi, R.2
Lee, Y.H.3
Young, C.4
Zeitzoff, P.5
Kwong, D.L.6
Bersuker, G.7
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12
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33847728664
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Detection of Trap Generation in High-κ Gate Stacks
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C. D. Young, D. Heh, S. Nadkarni, R. Choi, J. J. Peterson, H. R. Harris, J. H. Sim, S. A. Krishnan, J. Barnett, E. Vogel, B. H. Lee, P. Zeitzoff, G. A. Brown, and G. Bersuker, "Detection of Trap Generation in High-κ Gate Stacks," presented at International Integrated Reliability Workshop Final Report, pp. 79-83, 2005.
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(2005)
presented at International Integrated Reliability Workshop Final Report
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Young, C.D.1
Heh, D.2
Nadkarni, S.3
Choi, R.4
Peterson, J.J.5
Harris, H.R.6
Sim, J.H.7
Krishnan, S.A.8
Barnett, J.9
Vogel, E.10
Lee, B.H.11
Zeitzoff, P.12
Brown, G.A.13
Bersuker, G.14
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13
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84955276085
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2 gate dielectrics
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presented at
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2 gate dielectrics," presented at 41st Annual IEEE Intl. Reliability Physics Symp. Proc., pp. 41-45, 2003.
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(2003)
41st Annual IEEE Intl. Reliability Physics Symp. Proc
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Kerber, A.1
Cartier, E.2
Pantisano, L.3
Rosmeulen, M.4
Degraeve, R.5
Kauerauf, T.6
Groeseneken, G.7
Maes, H.E.8
Schwalke, U.9
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14
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84932139981
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2 dielectrics using charge pumping method
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presented at
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2 dielectrics using charge pumping method," presented at 42nd Annual IEEE Intl. Reliability Physics Symp. Proc, pp. 581-582, 2004.
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(2004)
42nd Annual IEEE Intl. Reliability Physics Symp. Proc
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Hou, T.H.1
Wang, M.F.2
Mai, K.L.3
Lin, Y.M.4
Yang, M.H.5
Yao, L.G.6
Jin, Y.7
Chen, S.C.8
Liang, M.S.9
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15
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33847738403
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Separating Interface Traps from Bulk Traps in High-k Gated MOSFETs Using Rise Time and Fall Time Dependence of Charge Pumping
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H. M. Bu and T. P. Ma, "Separating Interface Traps from Bulk Traps in High-k Gated MOSFETs Using Rise Time and Fall Time Dependence of Charge Pumping," as discussed at the 35th IEEE Semiconductor Interface Specialists Conference, 2004.
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(2004)
as discussed at the 35th IEEE Semiconductor Interface Specialists Conference
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Bu, H.M.1
Ma, T.P.2
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16
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33748109677
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J. Barnett, C. D. Young, N. Moumen, and G. Bersuker, Enhanced surface preparation techniques for the Si/high-k interface, in Ultra Clean Processing of Silicon Surfaces VII, 103-104, Solid State Phenomena, 2005, pp. 11-14.
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J. Barnett, C. D. Young, N. Moumen, and G. Bersuker, "Enhanced surface preparation techniques for the Si/high-k interface," in Ultra Clean Processing of Silicon Surfaces VII, vol. 103-104, Solid State Phenomena, 2005, pp. 11-14.
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18
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0021201529
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A reliable approach to charge-pumping measurements in MOS transistors
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G. Groeseneken, H. E. Maes, N. Beltran, and R. F. De Keersmaecker, "A reliable approach to charge-pumping measurements in MOS transistors," IEEE Transactions on Electron Devices, vol. 31, pp. 42-53, 1984.
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IEEE Transactions on Electron Devices
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Groeseneken, G.1
Maes, H.E.2
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19
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34250724534
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2 Gate Stack, submitted to IEEE Transactions on Electron Devices, 2006.
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2 Gate Stack," submitted to IEEE Transactions on Electron Devices, 2006.
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20
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0001323172
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Extraction of slow oxide trap concentration profiles in metal-oxide-semiconductor transistors using the charge pumping method
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Y. Maneglia and D. Bauza, "Extraction of slow oxide trap concentration profiles in metal-oxide-semiconductor transistors using the charge pumping method," Journal of Applied Physics, vol. 79, pp. 4187-4192, 1996.
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Maneglia, Y.1
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