Study of the Si chemical bonding and the semiconductive behavior of SiCN coatings and their correlation with anti-corrosion properties

Plasma Processes and Polymers

Volumn 4, Issue 2, 2007, Pages 173-179

  Loir, Anne Sophie ^a   Pech, David ^b   Steyer, Philippe ^b   Gachon, Yves ^c   Héau, Christophe ^c   Sánchez López, Juan Carlos ^a  

^a UNIVERSITY OF SEVILLE   (Spain)

^b UNIVERSITÉ DE LYON   (France)

^c HEF R and D   (France)

Author keywords

Auger electron spectroscopy (AES); Coatings; Corrosion; Plasma assisted chemical vapor deposition (PACVD); Semiconductors; Silicon nitride

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; CORROSION RESISTANCE; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; SILICONE COATINGS;

MOTT-SCHOTTKY EXPERIMENTS; POLARIZATION CURVES;

SEMICONDUCTING FILMS;

EID: 33947226984     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200600068     Document Type: Article

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