Bias voltage dependent electrochemical impedance spectroscopy of p- and n-type silicon substrates

Electrochimica Acta

Volumn 51, Issue 4, 2005, Pages 665-676

  Chemla, M ^a,c   Dufreche J F ^a   Darolles, I ^a   Rouelle, F ^a   Devilliers, D ^a   Petitdidier, S ^b   Levy D ^b  

^a CNRS   (France)

^b STMICROELECTRONICS   (France)

^c ISE ^*  (Japan)

Author keywords

Chronoamperometry; Electrochemical impedance; Flatband potential; Fourier transform; HF etching; Silicon

Indexed keywords

CHRONOAMPEROMETRY; HF ETCHING; SEMICONDUCTOR SUBSTRATES;

ELECTRIC SPACE CHARGE; ETCHING; SEMICONDUCTOR MATERIALS; SPECTROSCOPY; SUBSTRATES;

SILICON;

EID: 27144497269     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2005.05.028     Document Type: Article

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