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Volumn 482, Issue 1-2, 2005, Pages 183-187

Chemical structure of silicon-, oxygen- and nitrogen-containing a-C:H films prepared by RF plasma beam CVD

Author keywords

Auger parameter; Diamond like carbon; Silicon; XPS

Indexed keywords

ALUMINUM; AUGER ELECTRON SPECTROSCOPY; COMPOSITION; CROSSLINKING; ELECTRON CYCLOTRON RESONANCE; NITROGEN; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SILICON WAFERS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 17744395546     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.136     Document Type: Conference Paper
Times cited : (17)

References (20)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.