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Volumn 482, Issue 1-2, 2005, Pages 183-187
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Chemical structure of silicon-, oxygen- and nitrogen-containing a-C:H films prepared by RF plasma beam CVD
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Author keywords
Auger parameter; Diamond like carbon; Silicon; XPS
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Indexed keywords
ALUMINUM;
AUGER ELECTRON SPECTROSCOPY;
COMPOSITION;
CROSSLINKING;
ELECTRON CYCLOTRON RESONANCE;
NITROGEN;
OXYGEN;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON;
SILICON WAFERS;
X RAY PHOTOELECTRON SPECTROSCOPY;
AUGER PARAMETERS;
CHEMICAL STRUCTURES;
DIAMOND-LIKE CARBON;
VALENCE BAND ANALYSIS;
DIAMOND LIKE CARBON FILMS;
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EID: 17744395546
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2004.11.136 Document Type: Conference Paper |
Times cited : (17)
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References (20)
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