Low leakage current fluorinated LPD-SiO2/MOCVD-TiO2 films

Electrochemical and Solid-State Letters

Volumn 8, Issue 1, 2005, Pages

  Lee, Ming Kwei ^a   Huang, Jung Jie ^a   Wu, Tsung Shun ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

LEAKAGE CURRENTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOSFET DEVICES; PERMITTIVITY; SCANNING ELECTRON MICROSCOPY; SILICA; TITANIUM OXIDES; X RAY DIFFRACTION ANALYSIS;

CONDUCTION CURRENTS; CRYSTALLINE QUALITY; LIQUID PHASE DEPOSITION (LPD); PARAMETER ANALYZERS;

THIN FILMS;

EID: 12344265825     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836118     Document Type: Article

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