Effect of rapid thermal annealing on the structural and electrical properties of TiO2 thin films prepared by plasma enhanced CVD

Korean Journal of Chemical Engineering

Volumn 15, Issue 2, 1998, Pages 217-222

  Kim, Jong Wha ^a   Kim, Do Oh ^a   Hahn, Yoon Bong ^a  

^a Chonbuk National University   (South Korea)

Author keywords

Plasma Enhanced CVD; Rapid Thermal Annealing; Structural and Electrical Properties

Indexed keywords

EID: 0032388519     PISSN: 02561115     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02707075     Document Type: Article

References (9)

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