High aspect pattern fabrication by nano imprint lithography using fine diamond mold

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 3863-3866

  Hirai, Yoshihiko ^a   Yoshida, Satoshi ^a   Takagi, Nobuyuki ^a   Tanaka, Yoshio ^a   Yabe, Hideki ^b   Sasaki, Kei ^b   Sumitani, Hiroaki ^b   Yamamoto, Kazuhiro ^c  

^a Osaka Prefecture University   (Japan)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

^c OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

Author keywords

Fracture; High aspect ratio; Mold; Molecular weight; Nano imprint; Polymer; Stretching; Thermal expansion

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMONDS; ELECTRON CYCLOTRON RESONANCE; FRACTURE MECHANICS; PATTERN MATCHING; POLYMERS;

NANOIMPRINT LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0042864434     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3863     Document Type: Conference Paper

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