A study of resist flow during nanoimprint lithography

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 670-675

  MacIntyre, D S ^a   Thoms, S ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

Nanoimprint lithography; Resist flow

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEFECTS; LITHOGRAPHY; POLYMERS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS;

DAMAGE; GRIDS; NANOIMPRINT LITHOGRAPHY; RESIST FLOW;

NANOTECHNOLOGY;

EID: 14944348728     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.083     Document Type: Conference Paper

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