메뉴 건너뛰기




Volumn 53, Issue 6, 2006, Pages 3195-3202

Impact of heavy-ion strikes on nanocrystal non volatile memory cell arrays

Author keywords

CMOS memory integrated circuits; Heavy ion irradiation; Non volatile memories; Radiation effects

Indexed keywords

CHARGE LOSS; CMOS MEMORY INTEGRATED CIRCUITS; HEAVY ION IRRADIATION; NANOCRYSTAL STORAGE;

EID: 33846312092     PISSN: 00189499     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNS.2006.885004     Document Type: Conference Paper
Times cited : (7)

References (29)
  • 4
    • 0032002447 scopus 로고    scopus 로고
    • Stress Induced Leakage Current of tunnel oxide derived from read disturb characteristics
    • Feb
    • S. Satoh, G. Hermink, Hatakeyama, and S. Aritome, "Stress Induced Leakage Current of tunnel oxide derived from read disturb characteristics," IEEE Trans. Electron Devices, vol. 45, pp. 482-486, Feb. 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , pp. 482-486
    • Satoh, S.1    Hermink, G.2    Hatakeyama3    Aritome, S.4
  • 5
    • 17644445363 scopus 로고    scopus 로고
    • B. De Salvo, C. Gerardi, S. Lombarde, T. Baron, L. Perniola, D. Mariolle, P. Mur, A. Toffoli, M. Gely, M. N. Semeria, S. Deleonibus, G. Ammendola, V. Ancarani, M. Melanotte, R. Bez, L. Baldi, D. Corso, I. Crupi, R. A. Puglisi, G. Nicotra, E. Rimini, F. Mazen, G. Ghibaudo, G. Pananakakis, C. M. Compagnoni, D. Ielmini, A. Lacaita, A. Spinelli, Y. M. Wan, and K. van der Jeugd, How far will silicon nanocrystals push the scaling limits of NVMs technologies?, in Proc. IEEE Int. Electron Devices Meeting, Dec. 8-10, 2003, pp. 26.1.1-26.1.4.
    • B. De Salvo, C. Gerardi, S. Lombarde, T. Baron, L. Perniola, D. Mariolle, P. Mur, A. Toffoli, M. Gely, M. N. Semeria, S. Deleonibus, G. Ammendola, V. Ancarani, M. Melanotte, R. Bez, L. Baldi, D. Corso, I. Crupi, R. A. Puglisi, G. Nicotra, E. Rimini, F. Mazen, G. Ghibaudo, G. Pananakakis, C. M. Compagnoni, D. Ielmini, A. Lacaita, A. Spinelli, Y. M. Wan, and K. van der Jeugd, "How far will silicon nanocrystals push the scaling limits of NVMs technologies?," in Proc. IEEE Int. Electron Devices Meeting, Dec. 8-10, 2003, pp. 26.1.1-26.1.4.
  • 6
    • 11144242491 scopus 로고    scopus 로고
    • High total dose tolerance of prototype silicon nanocrystal non-volatile memory cells
    • Dec
    • M. P. Petkov, L. D. Bell, and H. A. Atwater, "High total dose tolerance of prototype silicon nanocrystal non-volatile memory cells," IEEE Trans Nucl. Sci., vol. 51, pp. 3822-3826, Dec. 2004.
    • (2004) IEEE Trans Nucl. Sci , vol.51 , pp. 3822-3826
    • Petkov, M.P.1    Bell, L.D.2    Atwater, H.A.3
  • 8
    • 0031103625 scopus 로고    scopus 로고
    • CAST: An electrical stress test to monitor single bit failures in flash-EEPROM structures
    • P. Cappelletti, R. Bez, D. Cantarelli, D. Nahmad, and L. Ravazzi, "CAST: An electrical stress test to monitor single bit failures in flash-EEPROM structures," Microelectron. Reliab., vol. 37, pp. 473-481, 1997.
    • (1997) Microelectron. Reliab , vol.37 , pp. 473-481
    • Cappelletti, P.1    Bez, R.2    Cantarelli, D.3    Nahmad, D.4    Ravazzi, L.5
  • 9
    • 0035417048 scopus 로고    scopus 로고
    • Select Transistor modulated cell array structure test application in EEPROM process reliability
    • F. Pio and E. Gomiero, "Select Transistor modulated cell array structure test application in EEPROM process reliability," Solid State Electron., vol. 45, pp. 1279-1291, 2001.
    • (2001) Solid State Electron , vol.45 , pp. 1279-1291
    • Pio, F.1    Gomiero, E.2
  • 10
    • 0035925937 scopus 로고    scopus 로고
    • SIRAD: An irradiation facility at the LNL Tandem accelerator for radiation damage studies on semiconductor detectors and electronic devices and systems
    • Apr
    • J. Wyss, D. Bisello, and D. Pantano, "SIRAD: an irradiation facility at the LNL Tandem accelerator for radiation damage studies on semiconductor detectors and electronic devices and systems," Nucl. Instrum. Methods Phys. Res. A, vol. A462, pp. 426-434, Apr. 2001.
    • (2001) Nucl. Instrum. Methods Phys. Res. A , vol.A462 , pp. 426-434
    • Wyss, J.1    Bisello, D.2    Pantano, D.3
  • 15
    • 0032306849 scopus 로고    scopus 로고
    • Radiation induced leakage current and stress induced leakage current in ultra-thin gate oxides
    • Dec
    • M. Ceschia, A. Paccagnella, A. Cester, A. Scarpa, and G. Ghidini, "Radiation induced leakage current and stress induced leakage current in ultra-thin gate oxides," IEEE Trans. Nucl. Sci., vol. 45, pp. 2375-2382, Dec. 1998.
    • (1998) IEEE Trans. Nucl. Sci , vol.45 , pp. 2375-2382
    • Ceschia, M.1    Paccagnella, A.2    Cester, A.3    Scarpa, A.4    Ghidini, G.5
  • 16
    • 0033312210 scopus 로고    scopus 로고
    • A model of radiation induced leakage current (RILC) in ultra-thin gate oxides
    • Dec
    • L. Larcher, A. Paccagnella, M. Ceschia, and G. Ghidini, "A model of radiation induced leakage current (RILC) in ultra-thin gate oxides," IEEE Trans. Nucl. Sci., vol. 46, pp. 1553-1561, Dec. 1999.
    • (1999) IEEE Trans. Nucl. Sci , vol.46 , pp. 1553-1561
    • Larcher, L.1    Paccagnella, A.2    Ceschia, M.3    Ghidini, G.4
  • 20
    • 0035720550 scopus 로고    scopus 로고
    • Noise characteristics of radiation-induced soft breakdown current in ultrathin oxides
    • Dec
    • A. Cester, L. Bandiera, M. Ceschia, G. Ghidini, and A. Paccagnella, "Noise characteristics of radiation-induced soft breakdown current in ultrathin oxides," IEEE Trans. Nucl. Sci., vol. 48, p. 2093, Dec. 2001.
    • (2001) IEEE Trans. Nucl. Sci , vol.48 , pp. 2093
    • Cester, A.1    Bandiera, L.2    Ceschia, M.3    Ghidini, G.4    Paccagnella, A.5
  • 21
    • 0037068725 scopus 로고    scopus 로고
    • Wear-out and breakdown of ultra-thin gate oxides after irradiation
    • A. Cester, "Wear-out and breakdown of ultra-thin gate oxides after irradiation," Electron. Lett., vol. 38, no. 19, pp. 1137-1139, 2002.
    • (2002) Electron. Lett , vol.38 , Issue.19 , pp. 1137-1139
    • Cester, A.1
  • 24
    • 1242310268 scopus 로고    scopus 로고
    • Statistical model for radiation induced wear-out of ultrathin gate oxides after exposure to heavy ion irradiation
    • Dec
    • A. Cester, S. Cimino, E. Miranda, A. Candelori, G. Ghidini, and A. Paccagnella, "Statistical model for radiation induced wear-out of ultrathin gate oxides after exposure to heavy ion irradiation," IEEE Trans. Nucl. Sci., vol. 50, pp. 2167-2175, Dec. 2003.
    • (2003) IEEE Trans. Nucl. Sci , vol.50 , pp. 2167-2175
    • Cester, A.1    Cimino, S.2    Miranda, E.3    Candelori, A.4    Ghidini, G.5    Paccagnella, A.6
  • 28
    • 0026853994 scopus 로고
    • Border traps' in MOS devices
    • Apr
    • D. M. Fleetwood, '"Border traps' in MOS devices," IEEE Trans. Nucl. Sci., vol. 39, pp. 269-271, Apr. 1992.
    • (1992) IEEE Trans. Nucl. Sci , vol.39 , pp. 269-271
    • Fleetwood, D.M.1
  • 29
    • 0022865241 scopus 로고
    • Spatial dependence of trapped holes determined from tunneling analysis and measured annealing
    • Dec
    • T. R. Oldham, A. J. Lelis, and F. B. McLean, "Spatial dependence of trapped holes determined from tunneling analysis and measured annealing," IEEE Trans. Nucl. Sci., vol. NS-33, pp. 1203-1209, Dec. 1986.
    • (1986) IEEE Trans. Nucl. Sci , vol.NS-33 , pp. 1203-1209
    • Oldham, T.R.1    Lelis, A.J.2    McLean, F.B.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.