-
1
-
-
3142773890
-
Introduction to flash memory
-
R. Bez, E. Camerlinghi, A. Modelli, and A. Visconti, "Introduction to flash memory," in Proc. IEEE, 2003, vol. 91, no. 4, pp. 489-502.
-
(2003)
Proc. IEEE
, vol.91
, Issue.4
, pp. 489-502
-
-
Bez, R.1
Camerlinghi, E.2
Modelli, A.3
Visconti, A.4
-
2
-
-
20444483395
-
An overview of flash architectural developments
-
G. Compardo, M. Scotti, S. Scommegna, S. Pollara, and A. Silvagni, "An overview of flash architectural developments," in Proc. IEEE, 2003, vol. 91, no. 4, pp. 523-536.
-
(2003)
Proc. IEEE
, vol.91
, Issue.4
, pp. 523-536
-
-
Compardo, G.1
Scotti, M.2
Scommegna, S.3
Pollara, S.4
Silvagni, A.5
-
3
-
-
33748370563
-
Single event effects in NAND flash memory arrays
-
Aug
-
G. Cellere, A. Paccagnella, A. Visconti, M. Bonanomi, and S. Beltrami, "Single event effects in NAND flash memory arrays," IEEE Trans. Nucl. Sci., vol. 53, no. 4, pp. 1813-1818, Aug. 2006.
-
(2006)
IEEE Trans. Nucl. Sci
, vol.53
, Issue.4
, pp. 1813-1818
-
-
Cellere, G.1
Paccagnella, A.2
Visconti, A.3
Bonanomi, M.4
Beltrami, S.5
-
4
-
-
0242551720
-
A 90-nm CMOS 1.8-V, 2-Gb NAND flash memory for mass storage applications
-
J. Lee, S. Lee, O. Kwon, K. Lee, D. Byeon, I. Kim, K. Lee, Y. Lim, B. Choi, J. Lee, W. Shin, J. Choi, and K. Suh, "A 90-nm CMOS 1.8-V, 2-Gb NAND flash memory for mass storage applications," IEEE J. Solid-State. Circuits, vol. 38, no. 11, pp. 1934-1942, 2003.
-
(2003)
IEEE J. Solid-State. Circuits
, vol.38
, Issue.11
, pp. 1934-1942
-
-
Lee, J.1
Lee, S.2
Kwon, O.3
Lee, K.4
Byeon, D.5
Kim, I.6
Lee, K.7
Lim, Y.8
Choi, B.9
Lee, J.10
Shin, W.11
Choi, J.12
Suh, K.13
-
5
-
-
0021628031
-
Cosmic ray induced permanent damage in MNOS EAROMs
-
Dec
-
J. T. Blandford, A. E. Waskiewicz, and J. T. Pickel, "Cosmic ray induced permanent damage in MNOS EAROMs," IEEE Trans. Nucl. Sci., vol. NS-31, no. 6, pp. 1568-1570, Dec. 1984.
-
(1984)
IEEE Trans. Nucl. Sci
, vol.NS-31
, Issue.6
, pp. 1568-1570
-
-
Blandford, J.T.1
Waskiewicz, A.E.2
Pickel, J.T.3
-
6
-
-
0026382709
-
On the suitability of non-hardened high density SRAMs for space applications
-
Dec
-
R. Koga, W. R. Crain, K. B. Crawford, D. D. Lau, S. D. Pinkerton, B. K. Yi, and R. Chitty, "On the suitability of non-hardened high density SRAMs for space applications," IEEE Trans. Nucl. Sci., vol. 38, no. 6, pp. 1507-1513, Dec. 1991.
-
(1991)
IEEE Trans. Nucl. Sci
, vol.38
, Issue.6
, pp. 1507-1513
-
-
Koga, R.1
Crain, W.R.2
Crawford, K.B.3
Lau, D.D.4
Pinkerton, S.D.5
Yi, B.K.6
Chitty, R.7
-
7
-
-
44349168493
-
Heavy ion induced single hard errors in submicronic memories
-
Dec
-
C. Dufour, P. Gamier, T. Carriere, J. Beaucour, R. Eccofet, and M. Labrunee, "Heavy ion induced single hard errors in submicronic memories," IEEE Trans. Nucl. Sci., vol. 39, no. 6, pp. 1693-1697, Dec. 1992.
-
(1992)
IEEE Trans. Nucl. Sci
, vol.39
, Issue.6
, pp. 1693-1697
-
-
Dufour, C.1
Gamier, P.2
Carriere, T.3
Beaucour, J.4
Eccofet, R.5
Labrunee, M.6
-
8
-
-
0027875525
-
Total dose failures in advanced electronics from single ions
-
Dec
-
T. R. Oldham, K. W. Bennett, J. Beaucour, T. Carriere, C. Poivey, and P. Garnier, "Total dose failures in advanced electronics from single ions," IEEE Trans. Nucl. Sci., vol. 40, no. 6, pp. 1820-1830, Dec. 1993.
-
(1993)
IEEE Trans. Nucl. Sci
, vol.40
, Issue.6
, pp. 1820-1830
-
-
Oldham, T.R.1
Bennett, K.W.2
Beaucour, J.3
Carriere, T.4
Poivey, C.5
Garnier, P.6
-
9
-
-
0028709945
-
Characterization of single hard errors (SHE) in 1M-bit SRAMs from single ions
-
Dec
-
C. Poivey, T. Carriere, J. Beaucour, and T. R. Oldham, "Characterization of single hard errors (SHE) in 1M-bit SRAMs from single ions," IEEE Trans. Nucl. Sci., vol. 41, no. 6, pp. 2235-2239, Dec. 1994.
-
(1994)
IEEE Trans. Nucl. Sci
, vol.41
, Issue.6
, pp. 2235-2239
-
-
Poivey, C.1
Carriere, T.2
Beaucour, J.3
Oldham, T.R.4
-
10
-
-
0038107834
-
Total ionizing dose effects in MOS oxides and devices
-
Jun
-
T. R. Oldham and F. B. McLean, "Total ionizing dose effects in MOS oxides and devices," IEEE Trans. Nucl. Sci., vol. 50, no. 3, pp. 483-500, Jun. 2003.
-
(2003)
IEEE Trans. Nucl. Sci
, vol.50
, Issue.3
, pp. 483-500
-
-
Oldham, T.R.1
McLean, F.B.2
-
11
-
-
0031357733
-
Ionizing radiation induced leakage current on ultra-thin gate oxides
-
Dec
-
A. Scarpa, A. Paccagnella, F. Montera, G. Ghibaudo, G. Pananakakis, G. Ghidini, and P. G. Fuochi, "Ionizing radiation induced leakage current on ultra-thin gate oxides," IEEE Trans. Nucl. Sci., vol. 44, no. 6, pp. 1818-25, Dec. 1997.
-
(1997)
IEEE Trans. Nucl. Sci
, vol.44
, Issue.6
, pp. 1818-1825
-
-
Scarpa, A.1
Paccagnella, A.2
Montera, F.3
Ghibaudo, G.4
Pananakakis, G.5
Ghidini, G.6
Fuochi, P.G.7
-
12
-
-
0032306849
-
Radiation induced leakage current and stress induced leakage current in ultra-thin gate oxides
-
Dec
-
M. Ceschia, A. Paccagnella, A. Cester, A. Scarpa, and G. Ghidini, "Radiation induced leakage current and stress induced leakage current in ultra-thin gate oxides," IEEE Trans. Nucl. Sci., vol. 45, no. 6, pp. 2375-2382, Dec. 1998.
-
(1998)
IEEE Trans. Nucl. Sci
, vol.45
, Issue.6
, pp. 2375-2382
-
-
Ceschia, M.1
Paccagnella, A.2
Cester, A.3
Scarpa, A.4
Ghidini, G.5
-
13
-
-
0033312210
-
A model of radiation induced leakage current (RILC) in ultra-thin gate oxides
-
Dec
-
L. Larcher, A. Paccagnella, M. Ceschia, and G. Ghidini, "A model of radiation induced leakage current (RILC) in ultra-thin gate oxides," IEEE Trans. Nucl. Sci., vol. 46, no. 6, pp. 1553-1561, Dec. 1999.
-
(1999)
IEEE Trans. Nucl. Sci
, vol.46
, Issue.6
, pp. 1553-1561
-
-
Larcher, L.1
Paccagnella, A.2
Ceschia, M.3
Ghidini, G.4
-
14
-
-
0035722064
-
Heavy ion induced soft breakdown of thin gate oxides
-
Dec
-
J. F. Conley, J. S. Suehle, A. H. Johnston, B. Wang, T. Miyahara, E. M. Vogel, and J. B. Bernstein, "Heavy ion induced soft breakdown of thin gate oxides," IEEE Trans. Nucl. Sci., vol. 48, no. 6, pp. 1913-1916, Dec. 2001.
-
(2001)
IEEE Trans. Nucl. Sci
, vol.48
, Issue.6
, pp. 1913-1916
-
-
Conley, J.F.1
Suehle, J.S.2
Johnston, A.H.3
Wang, B.4
Miyahara, T.5
Vogel, E.M.6
Bernstein, J.B.7
-
15
-
-
0035721958
-
Heavy-ion-induced breakdown in ultra-thin gate oxides and high-K dielectrics
-
Dec
-
L. W. Massengill, B. K. Choi, D. M. Fleetwood, R. D. Schrimpf, K. F. Galloway, M. R. Shaneyfelt, T. L. Meisenheimer, P. E. Dodd, J. R. Schwank, Y. M. Lee, R. S. Johnson, and G. Lucovsky, "Heavy-ion-induced breakdown in ultra-thin gate oxides and high-K dielectrics," IEEE Trans. Nucl. Sci., vol. 48, no. 6, pp. 1904-1912, Dec. 2001.
-
(2001)
IEEE Trans. Nucl. Sci
, vol.48
, Issue.6
, pp. 1904-1912
-
-
Massengill, L.W.1
Choi, B.K.2
Fleetwood, D.M.3
Schrimpf, R.D.4
Galloway, K.F.5
Shaneyfelt, M.R.6
Meisenheimer, T.L.7
Dodd, P.E.8
Schwank, J.R.9
Lee, Y.M.10
Johnson, R.S.11
Lucovsky, G.12
-
17
-
-
0033306963
-
Radiation effects on advanced flash memories
-
Dec
-
D. N. Nguyen, S. M. Guertin, G. M. Swift, and A. H. Johnston, "Radiation effects on advanced flash memories," IEEE Trans. Nucl. Sci., vol. 46, no. 6, pp. 1744-1750, Dec. 1999.
-
(1999)
IEEE Trans. Nucl. Sci
, vol.46
, Issue.6
, pp. 1744-1750
-
-
Nguyen, D.N.1
Guertin, S.M.2
Swift, G.M.3
Johnston, A.H.4
-
18
-
-
0032291504
-
Total ionizing dose effects on flash memories
-
D. N. Nguyen, C. I. Lee, and A. H. Johnston, "Total ionizing dose effects on flash memories," in Proc. IEEE Radiation Effects Data Workshop Rec., 1998, p. 100.
-
(1998)
Proc. IEEE Radiation Effects Data Workshop Rec
, pp. 100
-
-
Nguyen, D.N.1
Lee, C.I.2
Johnston, A.H.3
-
19
-
-
33646843945
-
Survey on flash technology with specific attention to critical process parameters related to manufacturing
-
G. Ginami, D. Canali, D. Fattore, G. Girardi, P. Scintu, L. Tarchini, and D. Tricarico, "Survey on flash technology with specific attention to critical process parameters related to manufacturing," in Proc. IEEE, 2003, vol. 91, no. 4, pp. 503-522.
-
(2003)
Proc. IEEE
, vol.91
, Issue.4
, pp. 503-522
-
-
Ginami, G.1
Canali, D.2
Fattore, D.3
Girardi, G.4
Scintu, P.5
Tarchini, L.6
Tricarico, D.7
-
20
-
-
0022865241
-
Spatial analysis of trapped holes from tunneling analysis
-
Dec
-
T. R. Oldham, A. J. Lelis, and F. B. McLean, "Spatial analysis of trapped holes from tunneling analysis," IEEE Trans. Nucl. Sci., vol. NS-33, no. 6, p. 1203, Dec. 1986.
-
(1986)
IEEE Trans. Nucl. Sci
, vol.NS-33
, Issue.6
, pp. 1203
-
-
Oldham, T.R.1
Lelis, A.J.2
McLean, F.B.3
-
21
-
-
33646836459
-
High-voltage management in single-supply CHE NOR-type flash memories
-
I. Motta, G. Ragone, O. Khouri, G. Torelli, and R. Micheloni, "High-voltage management in single-supply CHE NOR-type flash memories," in Proc. IEEE, 2003, vol. 91, no. 4, pp. 554-568.
-
(2003)
Proc. IEEE
, vol.91
, Issue.4
, pp. 554-568
-
-
Motta, I.1
Ragone, G.2
Khouri, O.3
Torelli, G.4
Micheloni, R.5
-
22
-
-
0031367537
-
CREME96: A revision of the cosmic ray effects on microelectronics code
-
Dec
-
A. J. Tylka, J. H. Adams, P. R. Broberg, B. Brownstein, W. F. Dietrich, E. O. Flueckiger, E. L. Petersen, M. A. Shea, D. F. Smart, and E. C. Smith, "CREME96: a revision of the cosmic ray effects on microelectronics code," IEEE Trans. Nucl. Sci., vol. 44, no. 6, pp. 2150-2160, Dec. 1997.
-
(1997)
IEEE Trans. Nucl. Sci
, vol.44
, Issue.6
, pp. 2150-2160
-
-
Tylka, A.J.1
Adams, J.H.2
Broberg, P.R.3
Brownstein, B.4
Dietrich, W.F.5
Flueckiger, E.O.6
Petersen, E.L.7
Shea, M.A.8
Smart, D.F.9
Smith, E.C.10
-
23
-
-
0036948062
-
Anomalous charge loss from floating-gate memory cells due to heavy ion irradiation
-
Dec
-
G. Cellere, A. Paccagnella, L. Larcher, A. Chimenton, J. Wyss, A. Candelori, and A. Modelli, "Anomalous charge loss from floating-gate memory cells due to heavy ion irradiation," IEEE Trans. Nucl. Sci, vol. 49, no. 6, pp. 3051-3058, Dec. 2002.
-
(2002)
IEEE Trans. Nucl. Sci
, vol.49
, Issue.6
, pp. 3051-3058
-
-
Cellere, G.1
Paccagnella, A.2
Larcher, L.3
Chimenton, A.4
Wyss, J.5
Candelori, A.6
Modelli, A.7
-
24
-
-
33144481902
-
Radiation induced leakage current in floating gate memory cells
-
Dec
-
G. Cellere, L. Larcher, A. Paccagnella, A. Visconti, and M. Bonanomi, "Radiation induced leakage current in floating gate memory cells," IEEE Trans. Nucl. Sci., vol. 52, no. 6, pp. 2144-2152, Dec. 2005.
-
(2005)
IEEE Trans. Nucl. Sci
, vol.52
, Issue.6
, pp. 2144-2152
-
-
Cellere, G.1
Larcher, L.2
Paccagnella, A.3
Visconti, A.4
Bonanomi, M.5
-
25
-
-
11044226028
-
Transient conductive path induced by a single ion in 10 nm SiO2 layers
-
Dec
-
G. Cellere, A. Paccagnella, A. Visconti, M. Bonanomi, and A. Candelori, "Transient conductive path induced by a single ion in 10 nm SiO2 layers," IEEE Trans. Nucl. Sci., vol. 51, no. 6, pp. 3304-3311, Dec. 2004.
-
(2004)
IEEE Trans. Nucl. Sci
, vol.51
, Issue.6
, pp. 3304-3311
-
-
Cellere, G.1
Paccagnella, A.2
Visconti, A.3
Bonanomi, M.4
Candelori, A.5
|