Front-to-back alignment techniques in microelectronics/MEMS fabrication: A review

Sensor Letters

Volumn 4, Issue 1, 2006, Pages 1-10

  Pal, Prem ^a   Kim, Yong Jun ^a   Chandra, Sudhir ^b  

^a Yonsei University   (South Korea)

^b INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

Front to back alignment; Lithography; Mask aligner; Mechanical jig and projector; MEMS

Indexed keywords

CALORIMETERS; FLUIDIC DEVICES; MASKS; MICROELECTRONICS; OPTICAL PROJECTORS; PHOTOLITHOGRAPHY;

FRONT-TO-BACK ALIGNMENT; MASK ALIGNER; MECHANICAL JIG;

MICROELECTROMECHANICAL DEVICES;

EID: 33845983629     PISSN: 1546198X     EISSN: None     Source Type: Journal    
DOI: 10.1166/sl.2006.007     Document Type: Review

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