Alignment of mask patterns to crystal orientation

Sensors and Actuators, A: Physical

Volumn 53, Issue 1-3, 1996, Pages 345-348

  Ensell, G ^a  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

Anisotropic etching; Mask alignment; Micromachining

Indexed keywords

EID: 0000079019     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/0924-4247(96)80158-0     Document Type: Article

References (2)

1. H. Seidel, L. Csepregi, A. Heuberger and H. Baumgärtel, Anisotropic etching of crystalline silicon in alkaline solutions, J. Electrochem. Soc., 137 (1990) 3612.
2. C.K. Tang and G.T. Reed, Highly efficient optical phase modulator in SOI waveguides, Electron. Lett., 31 (1995) 451.