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Volumn 2, Issue 1, 2004, Pages 78-81
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A new technique of front-to-back alignment for MEMS
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Author keywords
Front to back alignment; Mask aligner; MEMS
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Indexed keywords
ALIGNMENT;
MEMS;
MICROELECTROMECHANICAL DEVICES;
PHOTORESISTS;
SEMICONDUCTOR DEVICES;
SILICON WAFERS;
BULK SILICON MICROMACHINING;
FRONT-TO-BACK ALIGNMENT;
MASK ALIGNERS;
MASK ALIGNMENTS;
MASK DESIGNS;
MASK PLATES;
MEMS STRUCTURES;
MICRO-ELECTRO MECHANICAL SYSTEMS;
PATTERN TRANSFERS;
REFERENCE FRAMES;
SEMICONDUCTOR POWER DEVICES;
SHAPED PATTERNS;
WAFER DIAMETERS;
WAFER PROCESSING;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 13844263254
PISSN: 1546198X
EISSN: None
Source Type: Journal
DOI: 10.1166/sl.2004.026 Document Type: Article |
Times cited : (7)
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References (5)
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