Extended front-to-back alignment capability for MEMS/MOEMS applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 867-873

  Gui, Cheng Qun ^a   Van Buël, Willy ^a   Bijnen, Frans ^a   Lof, Joeri ^a  

^a ASML   (Netherlands)

Author keywords

Front To Back Alignment; Micro Electro Mechanical Systems; Micro Electro Opto Mechanical Systems; Micro Systems Technologies; Optical Microlithography

Indexed keywords

COMPUTER SOFTWARE; IMAGING TECHNIQUES; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY;

OPTICAL PROJECTION LITHOGRAPHY;

MICROELECTROMECHANICAL DEVICES;

EID: 0036381388     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472359     Document Type: Conference Paper

References (5)

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