Shot noise models for sequential processes and the role of lateral mixing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 4, 2006, Pages 1902-1908

  Neureuther, A R ^a   Pease, R F W ^b   Yuan, L ^c   Parizi, K Baghbani ^b   Esfandyarpour, H ^b   Poppe, W J ^a   Liddle, J A ^d   Anderson, E H ^d  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Stanford University   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACID DIFFUSION; EXTREME ULTRAVIOLET (EUV) EXPOSURE; SEQUENTIAL POISSON PROCESSES; SHOT NOISE MODELS;

ACIDS; AMPLIFICATION; DIFFUSION; DISSOLUTION; ELECTRON SCATTERING; MATHEMATICAL MODELS; POISSON DISTRIBUTION; SPURIOUS SIGNAL NOISE; STATISTICAL METHODS; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

ELECTRON BEAMS;

EID: 33746541122     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2218875     Document Type: Article

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