Determining the impact of statistical fluctuations on resist line edge roughness

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 2-10

  Leunissen, L H A ^a   Ercken, M ^a   Patsis, G P ^b  

^a IMEC   (Belgium)

^b INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Electron beam lithography; Line edge roughness; Shot noise

Indexed keywords

CONSTRAINT THEORY; DIFFUSION; EDGE DETECTION; ELECTRON BEAM LITHOGRAPHY; MONOMERS; POLYMERS; REDUCTION; SENSITIVITY ANALYSIS; SHOT NOISE; SURFACE ROUGHNESS;

CHEMICALLY AMPLIFIED RESISTS (CAR); ELECTRON DRIFT; FLUCTUATIONS; LINE EDGE ROUGHNESS;

PHOTORESISTORS;

EID: 14944344717     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.005     Document Type: Conference Paper

References (23)

1. D.C. Joy Microelectron. Eng. 1 1983 101
2. Geng Han, Mumit Khan, Yanghua Fang, and Franco Cerrina J. Vac. Sci. Technol. B 20 2002 2666
3. T. Kozawa, A. Saeki, A. Nakano, Y. Yoshida, and S. Tagawa J. Vac. Sci. Technol. B 21 6 2003 3149
4. M. Bohn, U. Hofmann, W. Hoppe, C.J. Progler, and M. Ryzhoukhin Proc. SPIE 5256 2003 695
5. M. Parikh J. Vac. Sci. Technol. 19 4 1981 1275
6. M. Ercken, L.H.A. Leunissen, I. Pollentier, E. Gogolides, G. Patsis, and V. Constantoudis Proc. SPIE 5375 2004 266
7. L.H.A. Leunissen, R. Jonckheere, U. Hofmann, N. Ünal, and C. Kalus Proc. EIPBN, J. Vac. Sci. Technol. B 22 2004 2943
8. MATLAB: Reference Guide, The MathWorks Inc., Natick, Mass, 1992
9. V. Constantoudis, G.P. Patsis, A. Tserepi, and E. Gogolides J. Vac. Sci. Technol. B 21 3 2003 1019
10. V. Constantoudis, G.P. Patsis, L.H.A. Leunissen, and E. Gogolides Proc. SPIE 5375 2004 967
11. T. Yamaguchi, H. Namatsu, M. Nagase, K. Yamazaki, and K. Kurihara Appl. Phys. Lett. 71 1997 2388
12. T. Yamaguchi, H. Namatsu, M. Nagase, K. Yamazaki, and K. Kurihara Proc. SPIE 3333 1998 830
13. H. Namatsu, Y. Takahashi, K. Yamazaki, T. Yamaguchi, M. Nagase, and K. Kurihara J. Vac. Sci. Technol. B 16 1998 69
14. T. Yamaguchi, H. Namatsu, M. Nagase, and K. Kurihara Proc. SPIE 3678 1999 617
15. H. Namatsu, T. Yamaguchi, and K. Kurihara Mater. Res. Soc. Symp. Proc. 584 2000 135
16. T. Yamaguchi, and H. Namatsu Proc. SPIE 4690 2002 921
17. T. Yamaguchi, K. Yamazaki, M. Nagase, and H. Namatsu Jpn. J. Appl. Phys. 42 2003 3755
18. H. Shiraishi, T. Yoshimura, T. Sakamizu, T. Ueno, and S. Okazaki J. Vac. Sci. Technol. B 12 1994 3895
19. T. Yoshimura, H. Shiraishi, J. Yamamoto, and S. Okazaki Jpn. J. Appl. Phys. 32 1993 6065
20. G.P. Patsis, V. Constantoudis, and E. Gogolides Microelectron. Eng. 75 3 2004 297
21. G.P. Patsis, E. Gogolides, J. Vac. Sci. Tech. B (accepted for publication)
22. H.I. Smith J. Vac. Sci. Technol. B 6 1 1988 346
23. International Roadmap for Semiconductors, SEMATECH, Austin, TX, 2003