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Volumn 110, Issue 41, 2006, Pages 20172-20176

Porogen approach for the fabrication of plasma-polymerized nanoporous polysiloxane films

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; NANOSTRUCTURED MATERIALS; PARAFFINS; PLASMA POLYMERIZATION; SPECTROSCOPIC ANALYSIS;

EID: 33751263732     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp063013t     Document Type: Article
Times cited : (26)

References (41)
  • 18
    • 33751299431 scopus 로고    scopus 로고
    • Jpn. Patent 2004-356508
    • Ohdaira, T.; Shioya, Y. Jpn. Patent 2004-356508, 2004.
    • (2004)
    • Ohdaira, T.1    Shioya, Y.2
  • 20
    • 33751287312 scopus 로고    scopus 로고
    • Jpn. Patent 2004-363403
    • Yoneda, K.; Yoshie, T. Jpn. Patent 2004-363403, 2004.
    • (2004)
    • Yoneda, K.1    Yoshie, T.2
  • 30
    • 0000261771 scopus 로고
    • Schrader, D. M., Jean. Y. C., Eds.; Elsevier: New York, Chapter 5
    • Nakanishi, H.; Jean. Y. C. In Positron and Positronium Chemistry; Schrader, D. M., Jean. Y. C., Eds.; Elsevier: New York, 1988, Chapter 5, pp 159-192.
    • (1988) Positron and Positronium Chemistry , pp. 159-192
    • Nakanishi, H.1    Jean, Y.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.