Synthesis and characterization of plasma-polymerized hexamethyldisiloxane films

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 176-179

  Kurosawa, Shigeru ^a   Choi, Bong Geun ^a,b   Park, Jong Won ^a   Aizawa, Hidenobu ^a   Shim, Kwang Bo ^b   Yamamoto, Kazuhiro ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b Hanyang University   (South Korea)

Author keywords

Deposition rate; Hexamethyldisiloxane (HMDSO); Plasma processing and deposition; Quartz crystal microbalance (QCM)

Indexed keywords

CRYSTALS; DEPOSITION; METHANOL; MONOMERS; PLASMAS; PLASTIC FILMS; QUARTZ; VAPOR PRESSURE;

POLYMERIZATION TIME;

POLYSILICON;

EID: 33645242390     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.210     Document Type: Conference Paper

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