SCOPUS 정보 검색 플랫폼

Volumn 91, Issue 3, 2002, Pages 1704-1706

Nanoporous structure of sputter-deposited silicon oxide films characterized by positronium annihilation spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PRESSURE; CAPPED SAMPLES; CHARACTERISTIC SIZE; DECAY PROBABILITY; NANOPOROUS STRUCTURES; POSITRON LIFETIME SPECTROSCOPY; THIN SILICON OXIDE;

OXIDE FILMS; POSITRON ANNIHILATION; POSITRON ANNIHILATION SPECTROSCOPY;

SILICON OXIDES;

EID: 0036469596 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1428787 Document Type: Article

Times cited : (52)

References (11)

1
- 0032166845
- amt ADVMEW 0935-9648
- J. L. Hedrick, R. D. Miller, C. J. Hawker, K. R. Carter, W. Volksen, D. Y. Yoon, and M. Trollsas, Adv. Mater. 10, 1049 (1998). amt ADVMEW 0935-9648
- (1998) Adv. Mater. , vol.10 , pp. 1049
- Hedrick, J.L.¹ Miller, R.D.² Hawker, C.J.³ Carter, K.R.⁴ Volksen, W.⁵ Yoon, D.Y.⁶ Trollsas, M.⁷

2
- 17044374061
- prb PRBMDO 0163-1829
- D. W. Gidley, W. E. Frieze, T. L. Dull, A. Y. Yee, E. T. Ryan, and H.-M. Ho, Phys. Rev. B 60, R5157 (1999). prb PRBMDO 0163-1829
- (1999) Phys. Rev. B , vol.60 , pp. 5157
- Gidley, D.W.¹ Frieze, W.E.² Dull, T.L.³ Yee, A.Y.⁴ Ryan, E.T.⁵ Ho, H.-M.⁶

3
- 0001076418
- apl APPLAB 0003-6951
- D. W. Gidley, W. E. Frieze, T. L. Dull, J. Sun, A. F. Yee, C. V. Nguyen, and D. Y. Yoon, Appl. Phys. Lett. 76, 1282 (2000). apl APPLAB 0003-6951
- (2000) Appl. Phys. Lett. , vol.76 , pp. 1282
- Gidley, D.W.¹ Frieze, W.E.² Dull, T.L.³ Sun, J.⁴ Yee, A.F.⁵ Nguyen, C.V.⁶ Yoon, D.Y.⁷

4
- 0000400571
- apl APPLAB 0003-6951
- M. Petkov, M. H. Weber, K. G. Lynn, and K. P. Rodbell, Appl. Phys. Lett. 77, 2470 (2000). apl APPLAB 0003-6951
- (2000) Appl. Phys. Lett. , vol.77 , pp. 2470
- Petkov, M.¹ Weber, M.H.² Lynn, K.G.³ Rodbell, K.P.⁴

5
- 0035007243
- msf MSFOEP 0255-5476
- K. P. Rodbell, M. P. Petkov, M. H. Weber, K. G. Lynn, Th. Gessmann, W. Volksen, and R. D. Miller, Mater. Sci. Forum 363-365, 15 (2001). msf MSFOEP 0255-5476
- (2001) Mater. Sci. Forum , vol.363-365 , pp. 15
- Rodbell, K.P.¹ Petkov, M.P.² Weber, M.H.³ Lynn, K.G.⁴ Gessmann, Th.⁵ Volksen, W.⁶ Miller, R.D.⁷

6
- 84861425797
- jjc JAPLD8 0021-4922
- R. Suzuki, T. Ohdaira, Y. Shioya, and T. Ishimaru, Jpn. J. Appl. Phys. 40, L1 (2001). jjc JAPLD8 0021-4922
- (2001) Jpn. J. Appl. Phys. , vol.40 , pp. 1
- Suzuki, R.¹ Ohdaira, T.² Shioya, Y.³ Ishimaru, T.⁴

7
- 20544478445
- and.
- K. Ito, H. Nakanishi, and Y. Ujihira, J. Phys. Chem. 103, 4555 (1999).
- (1999) J. Phys. Chem. , vol.103 , pp. 4555
- Ito, K.¹ Nakanishi, H.² Ujihira, Y.³

8
- 84861432209
- (in Japanese). jaJAPIAU 0021-8979
- E. Kondoh and Oyo Butsuri, J. Appl. Phys. 70, 546 (2001) (in Japanese). jap JAPIAU 0021-8979
- (2001) J. Appl. Phys. , vol.70 , pp. 546
- Kondoh, E.¹ Butsuri, O.²

9
- 0001366715
- prb PRBMDO 0163-1829
- Y. Kobayashi, I. Kojima, S. Hishita, T. Suzuki, E. Asari, and M. Kitajima, Phys. Rev. B 52, 823 (1995). prb PRBMDO 0163-1829
- (1995) Phys. Rev. B , vol.52 , pp. 823
- Kobayashi, Y.¹ Kojima, I.² Hishita, S.³ Suzuki, T.⁴ Asari, E.⁵ Kitajima, M.⁶

10
- 0026120607
- jjc JAPLD8 0021-4922
- R. Suzuki, Y. Kobayashi, T. Mikado, H. Ohgaki, M. Chiwaki, T. Yamazaki, and T. Tomimasu, Jpn. J. Appl. Phys. 30, L532 (1991). jjc JAPLD8 0021-4922
- (1991) Jpn. J. Appl. Phys. , vol.30 , pp. 532
- Suzuki, R.¹ Kobayashi, Y.² Mikado, T.³ Ohgaki, H.⁴ Chiwaki, M.⁵ Yamazaki, T.⁶ Tomimasu, T.⁷

11
- 0000102597
- jjb JAPNDE 0021-4922
- N. Koshizaki, Y. Yasumoto, and S. Terauchi, Jpn. J. Appl. Phys. 34, 119 (1995). jjb JAPNDE 0021-4922
- (1995) Jpn. J. Appl. Phys. , vol.34 , pp. 119
- Koshizaki, N.¹ Yasumoto, Y.² Terauchi, S.³

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