Ellipsometric sensitivity to halothane vapors of hexamethyldisiloxane plasma polymer films

Sensors and Actuators, B: Chemical

Volumn 44, Issue 1-3, 1997, Pages 243-247

  Guo, S ^a   Rochotzki, R ^b   Lundstrom I ^a   Arwin, H ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Ellipsometric sensitivity; Hexamethyldisiloxane plasma polymer films; Refractive index

Indexed keywords

DEPOSITION; ELLIPSOMETRY; HALOGEN COMPOUNDS; PARAFFINS; PLASTIC FILMS; REFRACTIVE INDEX;

HALOTHANE VAPORS; HEXAMETHYLDISILOXANE; PLASMA POLYMER FILMS;

CHEMICAL SENSORS;

EID: 0031247344     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(97)00216-5     Document Type: Article

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