Precursor chemistry for ULK CVD

Microelectronic Engineering

Volumn 82, Issue 3-4 SPEC. ISS., 2005, Pages 333-340

  Rouessac, V ^a   Favennec, L ^b   Remiat B ^c   Jousseaume, V ^c   Passemard, G ^b   Durand, J ^a  

^a UNIVERSITÉ DE MONTPELLIER   (France)

^b STMICROELECTRONICS   (France)

^c CEA LETI   (France)

Author keywords

PECVD; Porogens; Silicon based precursors; ULK materials

Indexed keywords

CHEMICAL BONDS; DIFFUSION; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROSITY; THIN FILMS; VAPORS;

POROGENS; SILICON-BASED PRECURSORS; ULK MATERIALS;

SILICON;

EID: 28044441574     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.07.071     Document Type: Conference Paper

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