Gas temperature and surface heating in plasma enhanced chemical-vapour- deposition

Plasma Sources Science and Technology

Volumn 15, Issue 4, 2006, Pages 783-789

  Nunomura, Shota ^a   Kondo, Michio ^a,b   Akatsuka, Hiroshi ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; EMISSION SPECTROSCOPY; HEATING; PHOTOVOLTAIC EFFECTS; PLASMA DENSITY; SILANES; SILICON; SURFACE REACTIONS;

GAS MOLECULES; GAS TEMPERATURE; PHOTOVOLTAIC APPLICATIONS; SURFACE HEATING;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 33750600651     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/4/023     Document Type: Article

References (49)

1. Spear W E and Le Comber P G 1975 Solid State Commun. 17 1193
2. Usui S and Kikuchi M 1979 J. Non-Cryst. Solids 34 1
3. Hamasaki T, Kurata H, Hirose M and Osaka Y 1980 Appl. Phys. Lett. 37 84
4. Matsuda A, Yamasaki S, Nakagawa K, Okushi H, Tanaka K, Iijima S, Matsumura M and Yamamoto H 1980 Japan. J. Appl. Phys. 19 L305
5. Rath J K, Franken R H J, Gordijn A, Schropp R E I and Goedheer W J 2004 J. Non-Cryst. Solids 338 56
6. van den Donker M N, Rech B, Finger F, Kessels W M M and van de Sanden M C M 2005 Appl. Phys. Lett. 19 263503
7. Amanatides E, Hammad A, Katsia E and Mataras D 2005 J. Appl. Phys. 97 073303
8. Tsuda M, Oikawa S and Sato S 1989 J. Chem. Phys. 91 6822
9. Matsuda A, Takai M, Nishimoto T and Kondo M 2003 Sol. Energy Mater. Sol. Cells 78 3
10. Guizot J-L, Nomoto K and Matsuda A 1991 Surf. Sci. 244 22
11. Guo L H, Kondo M, Fukawa M, Saitoh K and Matsuda A 1998 Japan. J. Appl. Phys. 37 L1116
12. Kurihara K, Sasaki K, Kawarada M and Koshino N 1988 Appl. Phys. Lett. 52 437
13. Kondo M 2003 Sol. Energy Mater. Sol. Cells 78 543
14. Teo K B K et al 2004 Nano Lett. 4 921
15. Bai B, Sawin H H and Cruden B A 2006 J. Appl. Phys. 99 013308
16. Takagi T, Hayashi R, Ganguly G, Kondo M and Matsuda A 1999 Thin Solid Films 345 75
17. Shiratani M, Maeda S, Koga K and Watanabe Y 2000 Japan. J. Appl. Phys. 39 287
18. Koga K, Kaguchi N, Shiratani M and Watanabe Y 2004 J. Vac. Sci. Technol. A 22 1536
19. Toyoshima Y, Arai K, Matsuda A and Tanaka K 1991 J. Non-Cryst. Solids 137/138 755
20. Matsuda A, Nomoto K, Takeuchi Y, Suzuki A, Yuuki A and Perrin J 1990 Surf. Sci. 227 50
21. Ishihara S, Otsuka A and Nagata S 1989 Appl. Phys. Lett. 55 2396
22. Faure G and Shkol'nik S M 1998 J. Phys. D: Appl. Phys. 31 1212
23. Donnelly V M and Malyshev M V 2000 Appl. Phys. Lett. 77 2467
24. Koike S, Sakamoto T, Kobori H, Matsuda H and Akatsuka H 2004 Japan. J. Appl. Phys. 43 5550
25. Kobayashi K and Uehara Y 2004 Thin Solid Films 193 146
26. Hebner G A 1996 J. Appl. Phys. 80 2624
27. Haverlag M, Stoffels E, Stoffels W W, Kroesen G M W and de Hoog F J 1996 J. Vac. Sci. Technol. A 14 380
28. Hata N, Matsuda A and Tanaka A 1986 J. Appl. Phys. 59 1872
29. Phillips D M 1975 J. Phys. D: Appl. Phys. 8 507
30. Capitelli M, Ferreira C M, Gordiets B F and Osipov A I 2000 Plasma Kinetics in Atmospheric Gases (Berlin: Springer)
31. Iijima S 1991 Nature 354 56
32. Kim Y H, Lee S K and Kim H J 2000 J. Vac. Sci. Technol. A 18 1216
33. Nunomura S, Koga K, Shiratani M, Watanabe Y, Morisada Y, Matsuki N and Ikeda S 2005 Japan. J. Appl. Phys. 44 L1509
34. Huber K P and Herzberg G 1979 Molecular Spectra and Molecular Structure (New York: Van Nostrand Reinhold)
35. Zare R N, Larsson E O and Berg R A 1965 J. Mol. Spectrosc. 15 117
36. Laux C O and Kruger C H 1992 J. Quant. Spectrosc. Radiat. Transfer 48 9
37. Niikura C, Kondo M and Matsuda A 2004 J. Non-Cryst. Solids 338-340 42
38. Niikura C, Itagaki N, Kondo M, Kawai Y and Matsuda A 2004 Thin Solid Films 457 84
39. Fujimoto T 1979 J. Phys. Soc. Japan. 47 273
40. Takai M, Nishimoto T, Kondo M and Matsuda A 2000 Appl. Phys. Lett. 77 2828
41. Donker M N, Schmitz R, Appenzeller R, Rech B, Kessels W M M and van de Sanden M C M 2006 Thin Solid Films 511 562
42. Stangeby P C 1984 Physics of Plasma-Wall Interaction in Controlled Fusion (New York: Plenum)
43. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharge and Material Processing (New York: Wiley)
44. Landau L D and Lifshitz E M 2000 Fluid Mechanics (Oxford: Butterworth Heinemann)
45. Gray D E (ed) 1972 American Institute of Physics Handbook 3rd edn (New York: McGraw-Hill)
46. Lide D R (ed) 2006 Handbook of Chemistry and Physics 86th edn (Florida: CRC Press)
47. Takashima S, Hori M, Goto T and Yoneda K 2001 J. Appl. Phys. 89 4727
48. Matsuda A 2004 Japan. J. Appl. Phys. 43 7909
49. Allan D C, Joannopoulos J D and Pollard W B 1982 Phys. Rev. B 25 1065