Fabrication of nanoparticle composite porous films having ultralow dielectric constant

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 50-52, 2005, Pages

  Nunomura, Shota ^a,c   Koga, Kazunori ^a   Shiratani, Masaharu ^a   Watanabe, Yukio ^a   Morisada, Yoshinori ^b   Matsuki, Nobuo ^b   Ikeda, Shingo ^b  

^a KYUSHU UNIVERSITY   (Japan)

^b ASM Japan KK   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Dielectric constant; ILD; Low k; LSI; Nanoparticles; Plasma CVD; Porous film

Indexed keywords

ADHESIVES; COMPOSITE MATERIALS; LSI CIRCUITS; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POROUS MATERIALS; SUBSTRATES;

ILD; LOW-K; LSI; NANOPARTICLES; PLASMA CVD; POROUS FILMS;

NANOSTRUCTURED MATERIALS;

EID: 31844432173     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.L1509     Document Type: Article

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