The role of plasma induced substrate heating during high rate deposition of microcrystalline silicon solar cells

Thin Solid Films

Volumn 511-512, Issue , 2006, Pages 562-566

  van den Donker, M N ^a   Schmitz, R ^a   Appenzeller, W ^a   Rech, B ^a   Kessels, W M M ^b   van de Sanden, M C M ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Hydrogen; Plasma processing and deposition; Raman scattering; Silane; Silicon; Solar cells

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; HYDROGEN; PYROMETRY; RAMAN SCATTERING; SILANES;

CRYSTALLINITY; FILM DEPOSITION; OPEN CIRCUIT VOLTAGE; PLASMA PROCESSING;

SILICON SOLAR CELLS;

EID: 33747390062     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.167     Document Type: Article

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