Structural characteristics of methylsilsesquioxane based porous low-k thin films fabricated with increasing cross-linked particle porogen loading

Journal of Applied Physics

Volumn 100, Issue 6, 2006, Pages

  Lee, Hae Jeong ^a   Soles, Christopher L ^a   Liu, Da Wei ^a   Bauer, Barry J ^a   Lin, Eric K ^a   Wu, Wen Li ^a   Gallagher, Michael ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b ROHM AND HAAS COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

METHYLSILSESQUIOXANE; PARTICLE POROGEN LOADING; X RAY POROSIMETRY (XRP); XRP ADSORPTION ISOTHERMS;

ADSORPTION; CROSSLINKING; ISOTHERMS; MICROPOROSITY; NEUTRON SCATTERING; POROUS MATERIALS; X RAY ANALYSIS;

THIN FILMS;

EID: 33749354398     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2337772     Document Type: Article

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