Development of the ultra-high-sensitive Kr adsorption technique to evaluate the pore-size distribution of thin-film materials

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 5, 2002, Pages 1833-1835

  Yanazawa, Hiroshi ^a   Mastunaga, Hironori ^a   Itoh, Hitoshi ^a   Nakai, Kazuyuki ^b   Suzuki, Isao ^c  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b BEL JAPAN INC   (Japan)

^c UTSUNOMIYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ADSORPTION ISOTHERMS; KRYPTON; MICROELECTRONIC PROCESSING; POROSITY; SENSITIVITY ANALYSIS; THIN FILM DEVICES;

BRUNAUER-EMMETT-TELLER THEORY; DOLLIMORE-HEAL METHOD; KELVIN EQUATION; KRYPTON ADSORPTION TECHNIQUE; PORE SIZE DISTRIBUTION; THIN FILM MATERIALS;

SEMICONDUCTOR DEVICE TESTING;

EID: 0036026342     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1500751     Document Type: Article

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