Effect of oxygen plasma exposure of porous spin-on-glass films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 3, 2000, Pages 1276-1280

  Kondoh, E ^a   Asano, T ^a   Nakashima, A ^b   Komatu, M ^b  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^b Catalysts/Chemicals Ind Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROPHOBICITY; OXIDATION; PLASMA SOURCES; POROUS MATERIALS; SHRINKAGE; SPUTTERING;

HYDROGEN METHYL SILOXANE; PLASMA OXIDATION; SPIN-ON-GLASS FILMS;

DIELECTRIC FILMS;

EID: 0034187375     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591374     Document Type: Article

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