Characterization of chemical-vapor-deposited low-k thin films using x-ray porosimetry

Applied Physics Letters

Volumn 82, Issue 7, 2003, Pages 1084-1086

  Lee, Hae Jeong ^a   Lin, Eric K ^a   Bauer, Barry J ^a   Wu, Wen Li ^a   Hwang, Byung Keun ^b   Gray, William D ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Dow Corning   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CHEMICAL BONDS; DENSIFICATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PERMITTIVITY; PORE SIZE; POROSIMETERS; POROSITY;

X-RAY POROSIMETRY;

THIN FILMS;

EID: 0037450266     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1553996     Document Type: Article

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