Ambient-dried SiO2 aerogel thin films and their dielectric application

Thin Solid Films

Volumn 348, Issue 1, 1999, Pages 69-73

  Yang, Hee Sun ^a   Choi, Se Young ^a   Hyun, Sang Hoon ^a   Park, Chan Gyung ^b  

^a Yonsei University   (South Korea)

^b Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AEROGELS; CHEMICAL BONDS; CHEMICAL MODIFICATION; COATING TECHNIQUES; CURRENT DENSITY; DEPOSITION; HEAT TREATMENT; PERMITTIVITY; REFRACTIVE INDEX; SILICA; SILICON; SUBSTRATES;

HEATING TEMPERATURE; LEAKAGE CURRENT DENSITY; SPIN COATING; SURFACE MODIFICATION; TRIMETHYLCHLOROSILANE; WET GEL FILM;

THIN FILMS;

EID: 0032651519     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00016-4     Document Type: Article

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