Nanostenciling of functional materials by room temperature pulsed laser deposition

IEEE Transactions on Nanotechnology

Volumn 5, Issue 5, 2006, Pages 470-476

  Cojocaru, Cristian Victor ^b   Harnagea, Catalin ^a,b   Pignolet, Alain ^a,b   Rosei, Federico ^a,b  

^a IEEE   (Canada)

^b INRS EMT   (Canada)

Author keywords

Atomic force microscopy; Functional materials; Nanostencils; Pulsed laser deposition; Unconventional patterning approaches

Indexed keywords

FUNCTIONAL MATERIALS; NANOSTENCILS; UNCONVENTIONAL PATTERNING APPROACHES;

ATOMIC FORCE MICROSCOPY; PULSED LASER DEPOSITION; SEMICONDUCTOR MATERIALS; SUBSTRATES; THERMAL EFFECTS; VACUUM APPLICATIONS;

NANOSTRUCTURED MATERIALS;

EID: 33748991988     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2006.880898     Document Type: Article

References (42)

1. F. Rosei, "Nanostructured surfaces: Challenges and frontiers in nanotechnology," J. Phys., Condens. Matter, vol. 16, no. 17, pp. S1373-S1436, May 2004.
2. C. V. Cojocaru, F. Ratto, C. Harnagea, A. Pignolet, and F. Rosei, "Semiconductors and insulator nanostructures: Challenges and opportunities," Microelectron. Eng., vol. 80, pp. 448-456, Jun. 2005.
3. M. Madou, Fundamentals of Microfabrication: The Science of Miniaturization, 2nd ed. Boca Raton, FL: CRC, Mar. 2002.
4. T. Ito and S. Okazaki, "Pushing the limits of lithography," Nature, vol. 406, pp. 1027-1031, Aug. 2000.
5. M. Rothschild, "Projection optical lithography," Mater. Today, vol. 8, no. 2, pp. 18-24, Feb. 2005.
6. B. Fay, "Advanced optical lithography development, from UV to EUV," Microelectron. Eng., vol. 61-62, pp. 11-24, Jul. 2002.
7. T. R. Groves, D. Pickard, B. Rafferty, N. Crosland, D. Adam, and G. Schubert, "Maskless electron beam lithography: Prospects, progress, and challenges," Microelectron. Eng., vol. 61-62, pp. 285-293, Jul. 2002.
8. Y. Xia, J. A. Rogers, K. E. Paul, and G. M. Whitesides, "Unconventional methods for fabricating and patterning nanostructures, " Chem. Rev., vol. 99, no. 7, pp. 1823-1848, Jul. 1999.
9. J. A. Rogers and R. G. Nuzzo, "Recent progress in soft lithography," Mater. Today, vol. 8, no. 2, pp. 50-56, Feb. 2005.
10. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, "Imprint of sub-25 nm vias and trenches in polymers," Appl. Phys. Lett., vol. 67, no. 21, pp. 3114-3116, Nov. 1995.
11. C. M. Sotomayor Torres, S. Zankovych, J. Seekamp, A. P. Kam, C. Clavijo Cedeno, and T. Hoffmann et al., "Nanoimprint lithography: An alternative nanofabrication approach," Mater. Sci. Eng. C, vol. 23, no. 1-2, pp. 23-31, Jan. 2003.
12. D. J. Resnick, S. V. Sreenivasan, and C. G. Wilson, "Step & flash imprint lithography," Mater. Today, vol. 8, no. 2, pp. 34-42, Feb. 2005.
13. R. Luthi, R. R. Schlittler, J. Brugger, P. Vettiger, M. E. Welland, and J. K. Gimzewski, "Parallel nanodevice fabrication using a combination of shadow mask and scanning probe methods," Appl. Phys. Lett., vol. 75, no. 9, pp. 1314-1316, Aug. 1999.
14. J. Brugger, J. W. Berenschot, S. Kuiper, W. Nijdam, B. Otter, and M. Elwenspoek, "Resistless patterning of sub-micron structures by evaporation through nanostencils," Microelectron. Eng., vol. 53, no. 1-4, pp. 403-405, Jun. 2000.
15. M. M. Deshmukh, D. C. Ralph, M. Thomas, and J. Silcox, "Nanofabrication using a stencil mask," Appl. Phys Lett., vol. 75, no. 11, pp. 1631-1633, Sep. 1999.
16. 4 shadow mask," Physica E, vol. 4, no. 3, pp. 196-200, Jul. 1999.
17. A. Tixier, Y. Mita, J. P. Gouy, and H. Fujita, "A silicon shadow mask for deposition on isolated areas," J. Micromech. Microeng., vol. 10, no. 2, pp. 157-162, Jun. 2000.
18. M. Kölbel, R. W. Tjerkstra, J. Brugger, C. J. M. van Rijn, W. Nijdam, J. Huskens, and D. N. Reinhoudt, "Shadow-mask evaporation through monolayer-modified nanostencils," Nano Lett., vol. 2, no. 12, pp. 1339-1343, Dec. 2002.
19. A. R. Champagne, A. J. Couture, F. Kuemmeth, and D. C. Ralph, "Nanometer-scale scanning sensors fabricated using stencil lithography," Appl. Phys. Lett., vol. 82, no. 7, pp. 1111-1113, Feb. 2003.
20. G. M. Kim, M. A. F. van den Boogaart, and J. Brugger, "Fabrication and application of a full wafer size micro/nanostencil for multiple length-scale surface patterning," Microelectron, Eng., vol. 67-68, pp. 609-614, Jun. 2003.
21. Y. X. Zhou, A. T. Johnson, J. Hone, and W. F. Smith, "Simple fabrication of molecular circuits by shadow mask evaporation," Nano Lett., vol. 3, no. 10, pp. 1371-1374, Oct. 2003.
22. X. M. Yan, A. M. Contreras, M. M. Koebel, J. A. Liddle, and G. A. Somorjai, "Parallel fabrication of sub-50-nm uniformly sized nanoparticles by deposition through a patterned silicon nitride nanostencil," Nano Lett., vol. 5, no. 6, pp. 1129-1134, Jun. 2005.
23. F. Vroegindeweij, E. A. Speets, J. A. J. Steen, J. Brugger, and D. H. A. Blank, "Exploring microstencils for sub-micron patterning using pulsed laser deposition," Appl. Phys. A, vol. 79, no. 4-6, pp. 743-745, Sep. 2004.
24. E. A. Speets, B. J. Ravoo, F. J. G. Roesthuis, F. Vroegindeweij, D. H. A. Blank, and D. N. Reinhoudt, "Fabrication of arrays of gold islands on self-assembled monolayers using pulsed laser deposition through nanosieves," Nano Lett., vol. 4, no. 5, pp. 841-844, May 2004.
25. S. Egger, A. Hie, Y. Fu, J. Chongsathien, D.-J. Kang, and M. Welland, "Dynamic shadow mask technique: A universal tool for nanoscience," Nano Lett., vol. 5, no. 1, p. 15, Jan. 2005.
26. C. V. Cojocaru, C. Harnagea, F. Rosei, A. Pignolet, M. A. F. van den Boogaart, and J. Brugger, "Complex oxide nanostructures by pulsed laser deposition through nanostencils," Appl. Phys. Lett., vol. 86, no. 18, p. 183107, May 2005.
27. H. J. Shin, J. H. Choi, H. J. Yang, Y. D. Park, Y. Kuk, and C. J. Kang, "Patterning of ferroelectric nanodot arrays using a slicon nitride shadow mask," Appl. Phys. Lett., vol. 87, no. 11, p. 113114, Sep. 2005.
28. J. Butschke, A. Ehrmann, B. Höfflinger, M. Irmscher, R. Käsmaier, and F. Letzkus et al., "SOI wafer flow process for stencil mask fabrication," Miroelectron. Eng., vol. 46, no. 1-4, pp. 473-476, May 1999.
29. M. A. F. van den Boogaart, G. M. Kim, R. Pellens, J. P. van den Heuvel, and J. Brugger, "Deep-ultraviolet-microelectromechanical systems stencils for high-throughput resistless patterning of mesoscopic structures," J. Vac. Sci. Technol. B, vol. 22, no. 6, pp. 3174-3177, Nov./Dec. 2004.
30. Pulsed Laser Deposition of Thin FilmsD. B. Chrisey and G. K. Hubler, Eds. New York: Wiley, 1994.
31. M. Abplanalp, L. M. Eng, and P. Günter, "Mapping the domain distribution at ferroelectric surfaces by scanning force microscopy," Appl. Phys. A, vol. 66, pp. S231-S234, Mar. 1998.
32. C. Harnagea and A. Pignolet, Nanoscale Characterisation of Ferroelectric Materials-Scanning Probe Micmscopy Approach, M. Alexe and A. Gruverman, Eds. Berlin, Germany: Springer-Verlag, 2004, pp. 47-64.
33. A. Rudiger, T. Schneller, A. Roelfos, S. Tiedke, T. Schmitz, and R. Waser, "Nanosize ferroelectric oxides-tracking down the superparaelectric limit," Appl. Phys. A, vol. 80, pp. 1247-1255, Mar. 2005.
34. G. A. Somorjai and R. M. Rioux, "High technology catalysts towards 100% selectivity: Fabrication, characterization and reaction studies," Catalysis Today, vol. 100, no. 3-4, pp. 201-215, Feb. 2005.
35. T. I. Kamins and R. S. Williams, "Lithographic positioning of selfassembled Ge islands on Si(001)," Appl. Phys. Lett., vol. 71, no. 9, pp. 1201-1203, Sep. 1997.
36. T. L Kamins, D. A. A. Ohlberg, R. S. Williams, W. Zhang, and S. Y. Chou, "Positioning of self-assembled, single-crystal, germanium islands by silicon nanoimprinting," Appl. Phys. Lett., vol. 74, no. 12, pp. 1773-1775, Mar. 1999.
37. F. Rosei and R. Rosei, "Atomic description of surface processes: diffusion and dynamics," Surf. Sci., vol. 500, no. 1-3, pp. 395-413, Mar. 2002.
38. M. S. Hegazy and H. E. Elsayed-Ali, "Self-assembly of Ge quantum dots on Si(100)-2 × 1 by pulsed laser deposition," Appl. Phys. Lett., vol. 86, no. 24, p. 23104, Jun. 2005.
39. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-Ray Photoelectron Spectroscopy, J. Chastain, Ed. Eden Prairie, MN: Physical Electronics Division, Perkin-Elmer Corp., 1992.
40. S. Hufner, S. Schmidt, and F. Reinert, "Photoelectron spectroscopy - an overview," Nucl. Instrum. Met. Phys. Res. A, vol. 547, no. 1, pp. 8-23, Jun. 2005.
41. 3 films," J. Appl. Phys., vol. 94, no. 9, pp. 5982-5989, Nov. 2003.
42. C. V. Cojocaru, C. Harnagea, A. Pignolet, and F. Rosei, in preparation.