Silicon shadow mask for deposition on isolated areas

Journal of Micromechanics and Microengineering

Volumn 10, Issue 2, 2000, Pages 157-162

  Tixier, A ^a   Mita, Y ^a   Gouy, J P ^a   Fujita, H ^a  

^a INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; EVAPORATION; MASKS; MICROELECTRONICS; REACTIVE ION ETCHING; SEMICONDUCTOR DEVICE STRUCTURES; SPUTTERING;

MECHANICAL ALIGNMENT STRUCTURES; SILICON SHADOW MASK;

SILICON WAFERS;

EID: 0033715606     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/10/2/310     Document Type: Article

References (3)

1. Chauvel D, Haese N, Rolland P A, Collard D and Fujita H 1997 A micro-machined microwave antenna integrated with its electrostatic spatial scanning MEMS'97 pp 84-9
2. Dhler G H, Hasnain G and Miller J N 1986 In situ grown-in selective contacts to n-i p-i doping superlattice crystals using molecular beam epitaxial growth through a shadow mask Appl. Phys. Lett. 49 704-6
3. Mita M, Mita Y, Toshiyoshi H and Fujita H 1999 Delay-masking process for silicon three-dimensional bulk structures Trans. IEE Japan 119-E 310-11