Laser-produced plasma light source development for extreme ultraviolet lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 3707-3712

  Komori, Hiroshi ^a   Soumagne, Georg ^a   Abe, Tamotsu ^a   Suganuma, Takashi ^a   Imai, Yousuke ^a   Someya, Hiroshi ^a   Takabayashi, Yuichi ^a   Endo, Akira ^a   Toyoda, Koichi ^a  

^a Hiratsuka Res and Devmt Center   (Japan)

Author keywords

Collector mirror damage; EUV light source; EUV lithography; Fast ion; Laser produced plasma

Indexed keywords

COLLECTOR MIRROR DAMAGE; EUV LIGHT SOURCE; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); FAST ION;

ATOMIC FORCE MICROSCOPY; CHARGE COUPLED DEVICES; LASER PRODUCED PLASMAS; PHOTODIODES; PLASMA DEVICES; POWER AMPLIFIERS; TRANSMISSION ELECTRON MICROSCOPY; XENON;

LITHOGRAPHY;

EID: 4444354361     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3707     Document Type: Conference Paper

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