Scaling studies of capping layer oxidation by water exposure with EUV radiation and electrons

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 666-674

  Clift, W Miles ^a   Klebanoff, Lennie ^a   Tarrio, Charles ^b   Grantham, Steve ^b   Wood II, O R ^c   Wurm, Stefan ^c   Edwards, N V ^c  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c SEMATECH   (United States)

Author keywords

Auger Electron Spectroscopy; Extreme Ultraviolet Lithography; Multilayer Mirror; Oxidation; Ruthenium; Silicon

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; MULTILAYER MIRRORS; PHOTON FLUX; RADIATION FLUX;

AUGER ELECTRON SPECTROSCOPY; ELECTRONS; HYDROCARBONS; MULTILAYERS; OXIDATION; OXIDATION RESISTANCE; PHOTONS; RADIATION EFFECTS; RUTHENIUM; SCALE (DEPOSITS); SILICON; ULTRAVIOLET RADIATION;

LITHOGRAPHY;

EID: 3843130643     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537403     Document Type: Conference Paper

References (4)

1. M. E. Malinowski, C. A. Steinhaus, D. E. Meeker, W. M. Clift, L. E. Klebanoff, S. Bajt, "Relation between electron and photon caused oxidation in EUVL optics", Proc. SPIE 5040, pp 477-486 (2003).
2. A. W. Czandera, Methods of Surface Analysis, p. 164, Elsevier Scientific publishing co., Amsterdam, 1975.
3. 2", Journal of Applied Physics, Vol. 45 No. 1, pp. 161-166, Jan. 1974.
4. th Edition, p. E-366, CRC Press Inc., Boca Raton, Florida, 1987