Relation between electron- and photon-caused oxidation in EUVL optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 429-438

  Malinowski, Michael E ^a   Steinhaus, Charles A ^a   Meeker, Donald E ^a   Clift, W Miles ^a   Klebanoff, Leonard E ^a   Bajt, Saša ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Electrons; ETS; Extreme ultraviolet; Multilayer mirror; Oxidation; Photoelectrons

Indexed keywords

COMPUTER AIDED SOFTWARE ENGINEERING; ELECTRON BEAMS; ELECTRONS; ENVIRONMENTAL TESTING; MIRRORS; MOLYBDENUM; OPTICS; OXIDATION; PHOTONS; SILICON; ULTRAVIOLET RADIATION;

ELECTRON BEAM EXPOSURES; EXTREME ULTRAVIOLET; MULTILAYER MIRROR; PHOTON CAUSED OXIDATION;

OPTICAL MULTILAYERS;

EID: 0141836093     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.499360     Document Type: Conference Paper

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