Computational modeling of process induced damage during plasma clean

Journal of Applied Physics

Volumn 100, Issue 2, 2006, Pages

  Rauf, S ^a   Haggag, A ^a   Moosa, M ^a   Ventzek, P L G ^a  

^a FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COUPLED PLASMA REACTORS; INTEGRATED CIRCUIT FABRICATION;

COMPUTATION THEORY; ELECTRIC REACTORS; FABRICATION; PERCOLATION (COMPUTER STORAGE); PLASMAS; PROCESS CONTROL;

INTEGRATED CIRCUITS;

EID: 33746861058     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2216253     Document Type: Article

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