Characterization of r.f. sputtered thin Mo, W and Si films as precursors to multilayer X-ray mirrors

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 248, Issue 2, 2006, Pages 264-272

  Bhattacharyya, D ^a   Joseph, D ^a   Poswal, A K ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

r.f. sputtering; X ray mirror; X ray reflectivity

Indexed keywords

ATOMIC FORCE MICROSCOPY; MIRRORS; MOLYBDENUM; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SPUTTERING; TUNGSTEN; X RAYS;

R.F. SPUTTERING; SI THIN FILMS; X-RAY MIRROR; X-RAY REFLECTIVITY;

THIN FILMS;

EID: 33745821725     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.03.195     Document Type: Article

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