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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 5, 2004, Pages 2353-2358

Investigation of nodule growth in ion beam sputtered Mo/Si multilayers

(5) Quesnel, E a Hue, J a Muffato, V a Pelle C a Lamy, P a

a CEA LETI (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURVE FITTING; DIFFUSION; GROWTH (MATERIALS); ION BEAMS; LATEXES; LITHOGRAPHY; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; PARTICLE SIZE ANALYSIS; POLYNOMIALS; POLYSTYRENES; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; THERMAL EXPANSION;

ADATOM SURFACE DIFFUSION; EXTREME-ULTRAVIOLET (EUV) LITHOGRAPHY; POLYSTYRENE LATEX (PSL); SHADOWING EFFECT;

MULTILAYERS;

EID: 9744258803 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1788677 Document Type: Article

Times cited : (8)

References (13)

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