Development of EUV resists in supercritical CO 2 solutions using CO 2 compatible salts (CCS): Results from a two level full factorial design of experiments (DOE)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Wagner, Mark ^a   DeYoung, James ^a   Harbinson, Chris ^a   Miles, Merrick ^a  

^a Micell Integrated Systems   (United States)

Author keywords

Aspect ratio; CCS; CO 2 compatible salts; DOE; EUV; LER; Lithography; LWR

Indexed keywords

CCS; CO 2 COMPATIBLE SALTS; DOE; EUV; LER; LWR;

ASPECT RATIO; CARBON DIOXIDE; IMAGE PROCESSING; OPTIMIZATION; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

PHOTORESISTS;

EID: 33745622889     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656272     Document Type: Conference Paper

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