An overview of supercritical CO2 applications in microelectronics processing

Microelectronic Engineering

Volumn 65, Issue 1-2, 2003, Pages 145-152

  Weibel, Gina L ^a   Ober, Christopher K ^a  

^a Cornell University   (United States)

Author keywords

Carbon dioxide cleaning; Carbon dioxide stripping; Chemical fluid deposition; Photoresist drying; Supercritical carbon dioxide

Indexed keywords

CARBON DIOXIDE; DIELECTRIC MATERIALS; MICROELECTRONICS; PHOTORESISTS; SUPERCRITICAL FLUIDS;

CHEMICAL FLUID DEPOSITION;

MICROELECTRONIC PROCESSING;

EID: 0036891858     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00747-5     Document Type: Article

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