The restoration of porous methylsilsesquioxane (p-MSQ) films using trimethylhalosilanes dissolved in supercritical carbon dioxide

Microelectronic Engineering

Volumn 82, Issue 3-4 SPEC. ISS., 2005, Pages 434-440

  Xie, Bo ^a   Muscat, Anthony J ^a  

^a University of Arizona   (United States)

Author keywords

Porous methylsilsesquioxane; Restoration; Supercritical carbon dioxide; TMBS; TMCS; TMIS; Trimethylhalosilanes

Indexed keywords

CARBON DIOXIDE; CONDENSATION; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PERMITTIVITY; POROSITY; RESTORATION; X RAY PHOTOELECTRON SPECTROSCOPY;

POROUS METHYLSILSESQUIOXANE; SUPERCRITICAL CARBON DIOXIDE; TMBS; TMCS; TMIS; TRIMETHYLHALOSILANES;

THIN FILMS;

EID: 28044446769     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.07.027     Document Type: Conference Paper

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