Combined pattern collapse and LWR control at 70 nm node through application of novel surface conditioner solutions

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 1018-1023

  Zhang, Peng ^a   Jaramillo Jr , Manuel ^a   Rao, Madhukar B ^a   Ross, Brenda ^a   Horvath, Bridget ^a   Wong, Patrick ^b   Gehoel, Wendy ^b   Sinkwitz, Stephan ^b  

^a AIR PRODUCTS AND CHEMICALS INC   (United States)

^b ASML   (Netherlands)

Author keywords

70nm dense lines; Line width roughness; Pattern collapse; Process window; Surface conditioner; Surfactant

Indexed keywords

70NM DENSE LINES; LINE WIDTH ROUGHNESS (LWR); PATTERN COLLAPSE; POST-DEVELOP PROCESS; PROCESS WINDOW; SURFACE CONDITIONER;

LITHOGRAPHY; REDUCTION; STANDARDS; SURFACE ACTIVE AGENTS; SURFACE ROUGHNESS; WSI CIRCUITS;

ROUGHNESS MEASUREMENT;

EID: 24644441648     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600039     Document Type: Conference Paper

References (8)

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