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Volumn 28, Issue 2, 2005, Pages
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Line edge roughness is here to stay
a
a
NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
ALGORITHMS;
ASPECT RATIO;
CHEMICAL MODIFICATION;
COMPUTER SIMULATION;
ELLIPSOMETRY;
ETCHING;
FREQUENCIES;
IMAGING TECHNIQUES;
MICROPROCESSOR CHIPS;
PROCESS ENGINEERING;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTOR DEVICE MANUFACTURE;
STATISTICAL METHODS;
APPLIED MATERIALS (CO);
FEI CO. (CO);
KLA-TENCOR CORP. (CO);
LINE EDGE ROUGHNESS (LER);
LITHOGRAPHY;
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EID: 18144371955
PISSN: 01633767
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Review |
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Times cited : (10)
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References (0)
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