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Volumn 9, Issue 6, 2006, Pages 26-31

Transistor scaling with novel materials

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATION; MATERIALS SCIENCE; PERFORMANCE; SEMICONDUCTOR DEVICE MANUFACTURE; TRANSISTORS;

EID: 33646895440     PISSN: 13697021     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-7021(06)71540-1     Document Type: Article
Times cited : (54)

References (51)
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    • Chang L., et al. Proc. IEEE 91 (2003) 1860
    • (2003) Proc. IEEE , vol.91 , pp. 1860
    • Chang, L.1
  • 12
    • 33646892285 scopus 로고    scopus 로고
    • Ishimaru, K., Rodder, M., Will Planar CMOS End? When? Why? Presented at International Symposium on VLSI Technology, Kyoto, Japan, (2005)
  • 16
    • 33646874250 scopus 로고    scopus 로고
    • Taur, Y., private communication
  • 17
    • 10844253101 scopus 로고    scopus 로고
    • Ieong M., et al. Science 306 (2004) 2057
    • (2004) Science , vol.306 , pp. 2057
    • Ieong, M.1
  • 18
    • 33847094662 scopus 로고    scopus 로고
    • Chan, V., et al., Strain for CMOS Performance Improvement. Presented at Custom Integrated Circuits Conference, San Jose, CA, USA, (2005)
  • 23
    • 0034794354 scopus 로고    scopus 로고
    • Strained Si NMOSFETs for high performance CMOS technology
    • Rim K., et al. Strained Si NMOSFETs for high performance CMOS technology. Tech. Dig. 2001 Symp. VLSI Technol. 23 (2001)
    • (2001) Tech. Dig. 2001 Symp. VLSI Technol. , vol.23
    • Rim, K.1
  • 33
    • 27144558305 scopus 로고    scopus 로고
    • Poly-Si/High-k Gate Stacks with Near-Ideal Threshold Voltage and Mobility
    • Frank M.M., et al. Poly-Si/High-k Gate Stacks with Near-Ideal Threshold Voltage and Mobility. Int. Symp. VLSI Technol. 97 (2005)
    • (2005) Int. Symp. VLSI Technol. , vol.97
    • Frank, M.M.1
  • 37
    • 33646860222 scopus 로고    scopus 로고
    • Presented at International Symposium on VLSI Technology, Kyoto, Japan
    • 2 (2005), Presented at International Symposium on VLSI Technology, Kyoto, Japan
    • (2005) 2
    • Cartier, E.1
  • 41
  • 42
    • 33646855476 scopus 로고    scopus 로고
    • Presented at Nano and Giga Challenges in Microelectronics International Symposium, Cracow, Poland
    • Topol A.W., et al. Contact Scaling for Advanced CMOS (2004), Presented at Nano and Giga Challenges in Microelectronics International Symposium, Cracow, Poland
    • (2004) Contact Scaling for Advanced CMOS
    • Topol, A.W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.