|
Volumn 392, Issue 2, 2001, Pages 174-183
|
Strategies for high rate reactive sputtering
|
Author keywords
Deposition process; Sputtering; Titanium oxide
|
Indexed keywords
ANODES;
CERAMIC MATERIALS;
CLOSED LOOP CONTROL SYSTEMS;
PLASMAS;
PROCESS CONTROL;
STOICHIOMETRY;
TITANIUM DIOXIDE;
HIGH RATE REACTIVE SPUTTERING;
SPUTTER DEPOSITION;
|
EID: 0035974532
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(01)01024-0 Document Type: Conference Paper |
Times cited : (11)
|
References (13)
|