Effects of negative low substrate bias voltage on the structure and properties of fluorinated amorphous carbon films synthesized by plasma immersion ion implantation and deposition

Surface and Coatings Technology

Volumn 186, Issue 1-2 SPEC. ISS., 2004, Pages 131-135

  Yao, Z Q ^a   Yang, P ^a   Huang, N ^a   Sun, H ^a   Wang, J ^a  

^a SOUTHWEST JIAOTONG UNIVERSITY   (China)

Author keywords

a C:F; Hydrophobic; Nano indentation; Raman; Substrate bias voltage

Indexed keywords

AMORPHOUS MATERIALS; BINARY MIXTURES; HYDROPHOBICITY; ION IMPLANTATION; METHANE; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

NANOINDENTATION; PLASMA IMMERSION ION IMPLANTATION-DEPOSITION (PIII-D); SESSILE DROP METHOD; SUBSTRATE BIAS VOLTAGE;

DIAMOND LIKE CARBON FILMS;

FILM;

EID: 17644388807     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.04.038     Document Type: Article

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